Vistec Semiconductor Systems Gmbh

Tillmann Ehrenberg

Klaus-Dieter Adam

Katrin Pietsch

Guenter Schieferstein

Uwe Goetz

A system for determining positions of structures on a substrate is disclosed. The system includes a plurality of stations enclosed by a housing. At least one of the stations inside the housing is designed to be movable. The housing is provided with a filter fan unit generating an air flow in the housing. Air-directing elements are provided in the housing so that an invariable flow may be achieved irrespective of the at least one movable station.

Method for determining positions of structures on a substrate

A device for measuring or inspecting substrates of the semiconductor industry, including a base frame and a module detachably mounted thereon via a module frame, wherein the module frame is detachably connected to the base frame via at least two self-aligning coupling elements and at least one alignment element, wherein the base frame and the module frame are in exactly defined spatial alignment with each other, when the module frame is detachably connected to the base frame.

Device for measuring or inspecting substrates of the semiconductor industry

A device for measuring the position of at least one structure on a substrate is disclosed. The substrate to be measured is positioned in a mirror body. A flat insert is provided in the mirror body and is formed such that the substrate and the insert together always have the same optical thickness, irrespective of the mechanical thickness of the substrate.

Device for measuring the position of at least one structure on a substrate

A device for measuring positions of structures () on a substrate () is disclosed, wherein the device is enclosed by a climatic chamber (). An illumination and imaging means () is also arranged in the climatic chamber (). At least one loading station () for substrates is formed on an outer wall () of the climatic chamber (), wherein at least one transport means () for transporting the substrates is provided within the climatic chamber (). A means () for orienting the substrates () with respect to a coordinate system of the coordinate measuring machine () is provided, wherein the transport means () deposits the substrates () on the means () for orienting.

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Schoeffengrund, Germany

Tillmann Ehrenberg