Asml Netherlands B.v.

Tijmen Wilfred Mathijs Gunther

Nicolaas Ten Kate

Nicolaas Rudolf Kemper

Michel Riepen

Marco Koert Stavenga

Erik Henricus Egidius Catharina Eummelen

Olga Vladimirovna Elisseeva

Christian Gerardus Norbertus Hendricus Marie Cloin

Michaël Christiaan Van Der Wekken

Koen Steffens

David Bessems

Danny Maria Hubertus Philips

Clemens Johannes Gerardus Van Den Dungen

A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

Lithographic apparatus and a method of operating the apparatus

A fluid handling structure and lithographic apparatus is disclosed in which measures are taken, in particular to the dimensions and spacing of an array of openings in a bottom surface of the fluid handling structure, to deal with and/or prevent formation of bubbles in immersion liquid.

Fluid handling structure, lithographic apparatus and device manufacturing method

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Utrecht, Netherlands

Tijmen Wilfred Mathijs Gunther