Asml Netherlands B.v.

Ties Wouter Van Der Woord

Marcus Adrianus Van De Kerkhof

Nitesh Pandey

Johan Hendrik Klootwijk

Pieter-Jan Van Zwol

Arnoud Willem Notenboom

Adrianus Johannes Maria Giesbers

David Ferdinand Vles

Evgenia Kurganova

Mária Péter

Maxim Aleksandrovich Nasalevich

Alexander Ludwig Klein

Andrey Alexandrovich Nikipelov

Sebastianus Adrianus Goorden

Paul Janssen

Jim Vincent Overkamp

Duygu Akbulut

Leonid Aizikovitsj Sjmaenok

Willem Joan Van Der Zande

Johannes Christiaan Leonardus Franken

Dennis De Graaf

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Aleksandar Nikolov Zdravkov

Alexey Sergeevich Kuznetsov

Jeroen Van Duivenbode

Peter Simon Antonius Knapen

Hendrikus Jan Wondergem

Edgar Alberto Osorio Oliveros

Mahdiar Valefi

Guilherme Brondani Torri

Jan Hendrik Willem Kuntzel

Luc Roger Simonne Haspeslagh

Sander Baltussen

Maxime Biron

Inci Donmez Noyan

Lourdes Ferre Llin

Anne-Sophie Rollier

Halil Gökay Yeǧen

Fabio Sbrizzai

Dmitry Kurilovich

Halil Gökay Yegen Yegen

A method of manufacturing a pellicle membrane, the method including: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly having a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus including such a pellicle.

Pellicle membrane

A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.

High force low voltage piezoelectric micromirror actuator

A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

Method of manufacturing a membrane assembly

A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.

Metal-silicide-nitridation for stress reduction

A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.

Membrane cleaning apparatus

Growing community of inventors

Eindhoven, Netherlands

Ties Wouter Van Der Woord