Boe Technology Group Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

Tianzhen Liu

Xianxue Duan

Kui Gong

Gaofei Shi

Chengcheng Wang

Jie Song

Zhihai Zhang

Yijun Wang

Haifeng Cui

Cheng Chen

Xuecheng Hou

Dezhi Xu

Qinghua Jiang

Dongsheng Jiao

The present disclosure relates to the field of display technology, and discloses a display substrate, a preparation method thereof, and a display panel, used for improving the structure of the display substrate, improving characteristics of a thin film transistor, and increasing the yield of a display product. The display substrate includes: a base substrate; a thin film transistor on the base substrate; and a flattening layer on a side, away from the base substrate, of the thin film transistor, wherein the flattening layer is provided with a groove around a channel area of the thin film transistor, and an orthographic projection of the groove on the base substrate is not overlapped with an orthographic projection of the channel area on the base substrate.

Display substrate, preparation method thereof, and display panel

The present invention provides an optical detection module, a method for manufacturing the same and an optical detection substrate. The optical detection module includes: a base substrate; a switch transistor on a side of the base substrate and including a gate electrode, an active layer, a first electrode and a second electrode; a photosensitive device for sensing light, on a side of the switch transistor away from the base substrate and including a power electrode, a photosensitive layer and an output electrode stacked in sequence, the output electrode being electrically connected to the first electrode of the switch transistor; a barrier on a side of the switch transistor away from the base substrate; and an insulation portion on the same layer as the output electrode and the barrier and connected between the output electrode and the barrier.

Optical detection module, method for manufacturing optical detection module, and optical detection substrate

The present disclosure discloses a display substrate, a production method thereof and a display device. The display substrate includes: a base substrate, a pixel defining layer located on the base substrate, and an organic functional layer located on the pixel defining layer, where the pixel defining layer has opening areas for defining light emitting areas of respective sub-pixels, and contains photo-induced deforming particles; and the organic functional layer covers the opening areas and includes a plurality of parts corresponding to the respective sub-pixels one by one, and the plurality of parts are spaced from each other.

Display substrate, production method thereof and display device

An array substrate, a method of driving an array substrate, a method of fabricating and array substrate, and a display panel including an array substrate are provided. The array substrate includes a base substrate, a first electrode and a second electrode on the base substrate, a polymer-dispersed liquid crystal layer between the first electrode and the second electrode, and a reflective layer on a side of the polymer-dispersed liquid crystal layer opposite from the base substrate. The polymer-dispersed liquid crystal layer is configured to switch between a transparent state and an opaque state in accordance with a voltage applied between the first electrode and the second electrode.

Array substrate, method of driving array substrate, method of fabricating array substrate, and display panel

The present disclosure provides a conductive wire structure, a manufacturing method thereof, an array substrate and a display device. The conductive wire structure includes a first conductive wire and a second conductive wire on a first plane, wherein a connection end of the first conductive wire is spaced apart from a connection end of the second conductive wire by a gap so as to discharge charges accumulated on the first conductive wire and the second conductive wire through the gap; an electrical connector connected to the connection end of the first conductive wire and the connection end of the second conductive wire, respectively, wherein a part of the electrical connector is located on a second plane different from the first plane.

Conductive wire structure and manufacturing method thereof, array substrate and display device

The present disclosure relates to a color film substrate, a method for manufacturing the color film substrate, a display device and a method for manufacturing the display device. The color film substrate comprises: a basal substrate; a color film layer arranged on a side of the basal substrate; a conductive layer arranged on another side of the basal substrate, the conductive layer comprising a plurality of conductive regions; each conductive region comprising a driving channel and an inducing channel; a first gap between the driving channel and the inducing channel in a same conductive region, a second gap between adjacent conductive regions; the first gap and the second gap correspond to a position of a black matrix in the color film layer; the black matrix being used for absorbing light, which light comes from a side of the basal substrate provided with the conductive layer, enters from the first gaps and the second gaps, and passes through the basal substrate. With the solution according to the embodiment of the present invention, the shadow elimination effect of a substrate can be ensured without adding or removing any layer structure for the color film substrate, thereby avoiding impacts on the other performances of the color film substrate.

Color film substrate, display device and method for manufacturing the same

A touch screen, a fabrication method thereof and a display device are provided. The method comprises: forming a touch electrode on a light emission side of a display panel after the display panel is formed; and forming an organic transparent insulation layer on the light emission side of the display panel where the touch electrode has been formed. An absolute value of a difference between a refractive index of the organic transparent insulation layer and a refractive index of the touch electrode is less than or equal to a predetermined value.

Touch screen, fabrication method thereof and display device

The present disclosure provides a poly-silicon TFT, its manufacturing method, an array substrate and its manufacturing method. The method for manufacturing the poly-silicon TFT includes a step of, subsequent to the formation of an amorphous-silicon active layer and a source electrode of the TFT, applying an electrical signal to the source electrode, so as to maintain the source electrode at a predetermined temperature for a predetermined time period, thereby to crystallize the amorphous active layer into a poly-silicon active layer due to heat generated by the source electrode and transferred to the amorphous active layer.

Methods for manufacturing poly-silicon thin film transistor and array substrate

The disclosed provides a thin film transistor, an array substrate, a display device and methods of manufacturing the thin film transistor and the array substrate. An active layer of the thin film transistor is formed of metallic oxide material, and a source electrode and a drain electrode of the thin film transistor both are formed of graphene or silver nanowire. The source electrode and the drain electrode are formed through an ink-jet printing process. Due to characteristics of graphene or silver nanowire, the manufacturing process of the thin film transistor may be simplified, the performance of the thin film transistor may be improved and the size of a channel region may be decreased. Further, an aperture ratio of the array substrate and the display device having such a thin film transistor may be increased.

Thin film transistor, array substrate and method of manufacturing the same

A metal complex having a structural formula as follows, wherein, the metal atom M is selected from the group consisting of iridium (Ir), platinum (Pt), osmium (Os), rhenium (Re), ruthenium (Ru) and copper (Cu); R, R, Rand Rare independently selected from the group consisting of &#x2014;F, &#x2014;CF, &#x2014;CHand substituted phenyl; in the (C^N) substructure located on a left side of the metal atom M in the structural formula (I), C is located in a first aromatic or heteroaromatic ring, and N is located in a second heteroaromatic ring. The metal complex can be used in luminescent material of display devices. 

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Beijing, China

Tianzhen Liu