Taiwan Semiconductor Manufacturing Comp. Ltd.

Tian Hu

Hung-Jui Kuo

Yu-Hsiang Hu

Sih-Hao Liao

Yung-Chi Chu

Chen-Hua Douglas Yu

A manufacturing method of a semiconductor package includes: laterally covering a sensing die with an encapsulant, where the encapsulant includes a top surface and a rounded inner edge connected to the top surface, and a top surface of the sensing die is lower than the rounded inner edge of the encapsulant and is smoother than the top surface of the encapsulant; and forming a redistribution structure on the top surface of the encapsulant and the top surface of the sensing die.

Fabricating a sensing component encapsulated by an encapsulation layer with roughed surface having a hollow region

A semiconductor device includes an encapsulant including a first hollow region, a sensing die in the first hollow region of the encapsulant, and a redistribution structure disposed on the encapsulant and the sensing die and electrically coupled to the sensing die. A top width of the hollow region is greater than a bottom width of the hollow region. The redistribution structure includes a second hollow region which exposes a sensing area of the sensing die, and the redistribution structure is slanted downward from an edge of the device toward the sensing area.

Sensing die encapsulated by an encapsulant with a roughness surface having a hollow region

A package includes a die and a redistribution layer. A top surface of the die has a first area and a second area connected with the first area. The redistribution layer structure includes a first insulation layer, a redistribution layer, and a second insulation layer. The first insulation layer is overlapping with the second area. The redistribution layer is disposed above the die. The second insulation layer is disposed above the redistribution layer and overlapping with the second area and the first area. The second insulation layer covers a top surface of the first insulation layer and is in contact with a side surface of the first insulation layer and the top surface of the die.

Package

A semiconductor package includes a semiconductor die including a sensing component, an encapsulant laterally covering the semiconductor die, a through insulator via (TIV) and a dummy TIV penetrating through the encapsulant, a patterned dielectric layer disposed on the top surfaces of the encapsulant and the semiconductor die, a conductive pattern disposed on and inserted into the patterned dielectric layer to be in contact with the TIV and the semiconductor die, and a first dummy conductive pattern disposed on the patterned dielectric layer and connected to the dummy TIV. The top surface of the encapsulant is above and rougher than a top surface of the semiconductor die, and the sensing component is accessibly exposed by the patterned dielectric layer.

Sensing component encapsulated by an encapsulant with a roughness surface having a hollow region

A semiconductor package includes a semiconductor die including a sensing component, an encapsulant extending along sidewalls of the semiconductor die, a through insulator via (TIV) and a dummy TIV penetrating through the encapsulant and disposed aside the semiconductor die, a patterned dielectric layer disposed on the encapsulant and exposing the sensing component of the semiconductor die, a conductive pattern disposed on the patterned dielectric layer and extending to be in contact with the TIV and the semiconductor die, and a first dummy conductive pattern disposed on the patterned dielectric layer and connected to the dummy TIV through an alignment opening of the first patterned dielectric layer. The semiconductor die is in a hollow region of the encapsulant, and a top width of the hollow region is greater than a width of the semiconductor die.

Sensing component encapsulated by an encapsulation layer with a roughness surface having a hollow region

A package includes a first redistribution structure, a die, a plurality of conductive structures, an encapsulant, and a second redistribution structure. The first redistribution structure includes a composite dielectric layer, a plurality of under bump metallization patterns, a dielectric layer, and a plurality of conductive patterns. The composite dielectric layer includes a first sub-layer and a second sub-layer stacked on the first sub-layer. The under bump metallization patterns are over the first sub-layer and penetrate through the composite dielectric layer. The dielectric layer is disposed on the second sub-layer of the composite dielectric layer. The conductive patterns are embedded in the dielectric layer. The die and the conductive structures are on the first redistribution structure. The encapsulant encapsulates the die and the conductive structures. The second redistribution structure is over the conductive structures, the encapsulant, and the die.

Package and manufacturing method thereof

A method includes depositing a photonic structure over a substrate, the photonic structure including photonic semiconductor layer, forming conductive pads over the photonic structure, forming a hard mask over the conductive pads, wherein the hard mask is patterned to cover each conductive pad with a hard mask region, etching the photonic structure using the hard mask as an etching mask to form multiple mesa structures protruding from the substrate, each mesa structure including a portion of the photonic structure, a contact pad, and a hard mask region, depositing a first photoresist over the multiple mesa structures, depositing a second photoresist over the first photoresist, patterning the second photoresist to expose the hard mask regions of the multiple mesa structures, and etching the hard mask regions to expose portions of the contact pads of the multiple mesa structures.

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Hsinchu, Taiwan

Tian Hu