Asml Netherlands B.v.

Asml Holding N.v.

Tian Gang

Todd R Downey

Janardan Nath

Duan-Fu Stephen Hsu

Joseph Harry Lyons

Christopher John Mason

Kalyan Kumar Mankala

Marco Matheus Louis Steeghs

Mehdi Yousefi Moghaddam

Nicholas Stephen Apone

Alexander Harris Ledbetter

Ozer Unluhisarcikli

A method for source mask optimization or mask only optimization used to image a pattern onto a substrate. The method includes determining a non-uniform illumination intensity profile for illumination; and determining one or more adjustments for the pattern based on the non-uniform illumination intensity profile until a determination that features patterned onto a substrate substantially match a target design. The non-uniform illumination intensity profile may be determined based on an illumination optical system and projection optics of a lithographic apparatus. In some embodiments, the lithographic apparatus includes a slit, and the non-uniform illumination profile is a through slit non-uniform illumination intensity profile. Determining the one or more adjustments for the pattern may include performing optical proximity correction, for example.

Optimization using a non-uniform illumination intensity profile

An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.

Lithographic apparatus and illumination uniformity correction system

A mirror array, at least some of the mirrors of the array comprising a reflective surface and an arm which extends from a surface opposite to the reflective surface, wherein the mirror array further comprises a support structure provided with a plurality of sensing apparatuses, the sensing apparatuses being configured to measure gaps between the sensing apparatuses and the arms which extend from the mirrors.

Mirror array

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Tian Gang