City University of Hong Kong

Thuc Hue Ly

Honglin Chen

Ping Man

Ka Ho Leung

Haijun Liu

Lingli Huang

Quoc Huy Thi

The present invention is concerned with a method of generating a lubrication interface. The method has the steps of a) providing a target substrate and a growth substrate adjacent the target substrate with a confinement space defined therebetween, b) allowing a predetermined amount of water onto a surface of the target substrate in the confinement space thus forming a water layer, c) adding a predetermined amount of a sample of a molybdenum disulfides (MoS) layer on the water layer thus allowing the water in the water layer to bind with the surface of the molybdenum disulfides (MoS) layer, d) cooling down the target substrate to cryogenic temperature so as to freeze the water layer thus forming a molybdenum disulfides (MoS) ice layer on the target substrate, and e) detaching the growth substrate from the molybdenum disulfides (MoS) ice layer thus leaving the molybdenum disulfides (MoS) ice layer.

Methods of generating a lubrication interface, methods of enhanching lubrication of moving parts and lubricants

Disclosed herein are methods for transferring two-dimensional (2D) materials between substrates with the aid of ice, in which the ice serves as a supporting layer for the transfer of the 2D materials. The methods include the transfer of materials such as the 2D materials between substrates including the ice-aided transfer of ultra-clean materials.

Methods of the ultra-clean transfer of two-dimensional materials

Disclosed herein is a method of producing a substrate having a single-layer transition metal selenide (TMS) nanoflakes deposited thereon. The method is characterized in not using hydrogen as a reducing agent during the deposition of monolayer TMS nanoflakes on the substrate. Such substrates may serve as an optic, an electronic device, a mechanic, a sensor etc.

Methods of producing single-layer transition metal selenide

Disclosed herein is a method of producing a substrate having a wrinkle pattern of a single-layer rhenium disulfide (ReS) nanoflakes deposited thereon. The method is characterized by using ammonium rhenium and sulfur powders as the rhenium source and the sulfur source, respectively; and with the addition of molecular sieve to control the release of the rhenium source during the deposition of ReS, in which a single layer of ReSis deposited on a substrate via chemical vapor deposition. The single-layer ReSis then exposed to UV light to induce the formation of a wrinkle pattern.

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Hong Kong, China

Thuc Hue Ly