Merck Patent Gmbh

Thorsten Vom Stein

Dominik Joosten

Christian Ehrenreich

Tetsuo Okayasu

Toshiya Okamura

Dmitry Ushakov

Helga Haas

Caroline Wern

Stefan Lehmann

Katsuchika Suzuki

[Problem] To provide a polycarbosilazane making it possible to form a silicon-containing film which is bearable to acid etching, and a composition comprising the polycarbosilazane. [Means for Solution] The present invention provides a polycarbosilazane comprising a repeating unit of —[RRSi—(CH)]— and —(RRSi—NR)—, wherein R, R, Rand Rare each independently a single bond, hydrogen or Calkyl; Ris independently a single bond or hydrogen; and n is 1-2, and a composition comprising the polycarbosilazane. The present invention also provides a method for forming a silicon-containing film, comprising coating the composition above a substrate and heating.

Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the same

To provide a new silicon-containing polymer making it possible to form a cured film has features that its residual stress is small and crack resistance is high. A polycarbosilazane having particular cyclic structures.

The present invention relates to 2,3-dihydrobenzothiophene derivatives of the general formula I  In which the occurring groups and parameters have the meanings indicated in claim to the use thereof in liquid-crystalline or mesogenic media, to liquid-crystalline or mesogenic media comprising these derivatives, and to electro-optical display elements containing these liquid-crystalline or mesogenic media.

2,3-dihydrobenzothiophene derivatives

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Darmstadt, Germany

Thorsten Vom Stein