Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Carl Zelss Smt Ag

Thorsten Rassel

Juergen Fischer

Erich Merz

Karl-Eugen Aubele

Hubert Holderer

Ulrich Weber

Alexander Kohl

Johannes Lippert

Wolfgang Hummel

Jochen Weber

Klaus Rief

Raoul Reiner

Markus Neumaier

Armin Schoeppach

Michael Muehlbeyer

Norbert Muehlberger

Matthias Orth

Stefan Schoengart

Baerbel Trossbach

Markus Hauf

Armin Werber

Juergen Huber

Martin Mahlmann

Stephan Back

Baerbel Schwaer

Michael Mühlbeyer

Jürgen Fischer

Stefan Schöngart

Bärbel Trossbach

Reiner Raoul

A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.

Projection exposure apparatus for microlithography for the production of semiconductor components

A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.

Gravitation compensation for optical elements in projection exposure apparatuses

A multi facet mirror of a microlithographic projection exposure apparatus includes a plurality of mirror facet units. Each unit includes a mirror member with a body, a reflective coating provided at one end of the body and an actuating surface provided at an opposite end. The unit further includes a rest member on which the actuating surface rests while the mirror member is not moving, and an actuator that tilts the mirror member about a tilting axis. The actuator has a contact surface and a lifting member which moves the actuating surface along a lifting direction. In a first operating state of the lifting member the actuating surface rests on the rest member and in a second operating state on the contact surface. A displacement member displaces the contact surface along a lateral direction only while the lifting member is in the second operating state.

Multi facet mirror of a microlithographic projection exposure apparatus

Multi facet mirror of a microlithographic projection exposure apparatus with a tilting actuator

The present disclosure relates to a method for the production and/or adjustment of an optical arrangement of a projection illumination system, in which at least one actuator is used to set the position of at least one optical element to be manipulated by moving the optical element incrementally with a specific increment size. The increment size of the movement increments is set as a function of the distance of the optical element from the desired position, with the distance being represented by a distance value. If the distance value is above a first threshold value, a substantially constant increment size is set, while the specific increment size decreases as the distance from the desired position decreases if the distance value is below the first threshold value. Alternatively or additionally, a pre-specified deviation from the specific increment size and/or from a pre-specified increment size change rate results in a warning signal and/or ceasing of the movement.

Positioning method for an optical arrangement of a projection illumination system

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Imaging device in a projection exposure facility

Imaging device in a projection exposure machine

An optical imaging device () has at least one optical element () which is provided with an outer frame (), an inner ring () in which the optical element () is mounted, and a manipulator instrument having at least one actuator. Contactless linkage of the inner ring () to the outer frame () is provided in at least one degree of freedom by means of a support () arranged between the inner ring () and the outer frame (). The manipulator instrument has at least one actuator (), the setting forces and/or bearing forces of which act contactlessly on the inner ring (), for mounting and/or positioning and/or manipulating the inner ring () relative to the outer frame ().

Optical imaging device

An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

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Huettlingen, Germany

Thorsten Rassel