International Business Machines Corporation

Leybold Vakuum Gmbh

Institut Fur Mikrotechnik Mainz Gmbh

Imm, Institut Fur Mikrotechnik Gmbh

Thomas Zetterer

Michael Abraham

Manfred Lacher

Werner Grosse Bley

Wolfgang Ehrfeld

Thomas Bohm

Ulrich Dobler

Martin Schmidt

Peter Pokrowsky

Alexander Ruf

Thomas R Dietrich

Bernd Stenkamp

Eckehard Kiefer

A gas passage (,) with a selectively acting penetration surface consisting of quartz, quartz glass, Pyrex glass or the like; in order to provide penetration surfaces which are relatively thin on the one hand but will withstand relatively great pressure differences on the other, it is proposed that the selectively acting penetration surface take the form of a plurality of adjacent windows (,).

Gas passage with selectively acting penetration surface and process for producing the penetration surface

An X-ray radiolucent material consisting of a beryllium substrate and a protective coating connected to the substrate is produced by applying a protective coating comprised of at least one component selected from the group consisting of silicon oxide, silicon nitride, silicon carbide, and amorphous carbon. Preferably, a CVD process or sputtering is used to apply the protective coating.

X-ray radiolucent material, method for its manufacture, and its use

A micropolarimeter comprises an analyzer (1) and a detector (3), which is typically a photodetector array. The detector has a circular configuration of a number N of sectors. Analyzer (1) and detector (3) form a unit with the analyzer assigning different polarization values to the sectors. Analyzer and the detector contain no moving parts. Three different embodiments are proposed for the analyzer: a glass cone, covered with a polarizing thin film stack, a metal grid polarizing array, and an array of polarizing waveguides. The micropolarimeter (14) is used preferably in a microellipsometer system which can serve as a tool for film diagnostics, especially optical characterization of thin films.

Micropolarimeter, microsensor system and method of characterizing thin

A sensor head (1) is described, which has a spacer (5b) between a carrier element (2) and the spring arm (7), which, perhaps carries a sensor tip (9) at the free end; the spacer defines the distance d between the spring arm (7) and the carrier element (2). In a preferred embodiment, the spacer (5b) comprises a sacrificial layer (5a), which is etched out, except for the spacer (5b), after the formation of a corresponding layer system between the spring arm (7) and the carrier element (2). The carrier element (2) and the spring arm (7) are each provided with a reflecting layer (4 and 6). In accordance with another specific embodiment, plasmonactive layers can also be provided.

Sensor head for use in atomic force microscopy and method for its

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Engelstadt, Germany

Thomas Zetterer