Asml Netherlands B.v.

Asml Holding N.v.

Thomas Venturino

Daniel Nicholas Galburt

Johannes Onvlee

Christopher Charles Ward

Daniel Nathan Burbank

Samir A Nayfeh

Herman Vogel

Frank Johannes Jacobus Van Boxtel

Laurentius Johannes Adrianus Van Bokhoven

Earl William Ebert

Mark Josef Schuster

Justin Matthew Verdirame

Abdullah Alikhan

Peter A Delmastro

Geoffrey Alan Schultz

Santiago E Delpuerto

An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.

Reticle cooling by non-uniform gas flow

A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.

Reticle cooling system in a lithographic apparatus

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Wilton, CT, United States of America

Thomas Venturino