Tokyo Electron Limited

Supercritical Systems, Inc.

Robbins Scientific Corporation

Thomas Robert Sutton

Maximilian Albert Biberger

Frederick Paul Layman

Alexei Sheydayi

Paul B Robbins

Arthur J Robbins

Robert Koch

Maximilan A Biberger

An isolation valve is preferably applied to the semiconductor industry for sealing a process vessel and also operates effectively at plus-atmospheric pressures. A double containment gate valve assembly includes a housing and a movable head assembly within the housing. The housing includes a first access opening and a second access opening. The head assembly is configurable into a first position where an access path through the first and second access openings is clear, and a second position where the access path is blocked.

Gate valve for plus-atmospheric pressure semiconductor process vessels

A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical drive mechanism couples the platen to the chamber housing. In operation, the mechanical drive mechanism separates the platen from the chamber housing for loading of the semiconductor substrate. In further operation, the mechanical drive mechanism causes the second sealing surface of the platen and the first sealing surface of the chamber housing to form a high pressure processing chamber around the semiconductor substrate.

High pressure processing chamber for semiconductor substrate

An apparatus for supercritical processing and non-supercritical processing of a workpiece comprises a transfer module, a supercritical processing module, a non-supercritical processing module, and a robot. The transfer module includes an entrance. The supercritical processing module and the non-supercritical processing module are coupled to the transfer module. The robot is preferably located within the transfer module. In operation, the robot transfers a workpiece from the entrance of the transfer module to the supercritical processing module. After supercritical processing, the robot then transfers workpiece from the supercritical processing module to the non-supercritical processing module. After the non-supercritical processing, the robot returns the workpiece to the entrance of the transfer module. Alternatively, the non-supercritical processing is performed before the supercritical processing.

Method of supercritical processing of a workpiece

Apparatus for supercritical processing of a workpiece

An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

Method for supercritical processing of multiple workpieces

Apparatus for supercritical processing of multiple workpieces

Method and apparatus for supercritical processing of multiple workpieces

A vacuum chuck for holding a semiconductor wafer during high pressure processing comprises a wafer platen, first through third lift pins, and an actuator mechanism. The wafer platen comprises a smooth surface, first through third lift pin holes, and a vacuum opening. In use, the vacuum opening applies vacuum to a surface of a semiconductor wafer, which chucks the semiconductor wafer to the wafer platen. The first through third lift pins mount within the first through third lift pin holes, respectively. The actuator mechanism couples the first through third lifting pins to the wafer platen. The actuator mechanism operates to extend the first through third lift pins in unison above the smooth surface of the wafer platen. The actuator mechanism operates to retract the first through third lift pins in unison to at least flush with the smooth surface of the wafer platen.

High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism

An apparatus for agitating a workpiece in a high pressure environment comprises a workpiece holder, a bearing, a pressure chamber housing, and a nozzle. The workpiece holder couples to the pressure chamber housing via the bearing. The nozzle couples to the pressure chamber housing. The workpiece holder comprises protrusions and a region for holding the workpiece. In operation a fluid exits the nozzle and impinges the protrusions of the workpiece holder causing the workpiece holder to rotate, which agitates the workpiece.

Method and apparatus for agitation of workpiece in high pressure environment

A locking microcentrifuge tube (10) is provided which is capable of being sealed in either of two manners, one being a friction-fit seal which is easily opened and the other being a 'locked' seal for higher stress applications. The tube body (12) is adapted to mate with the cap (14) at an aperture (24) such that the plug portion (36) of the cap (14) and the aperture (24) form the friction-fit seal at the early stages of insertion. A collar (26) is provided about the aperture (24) on the tube body (12). The collar (26) is formed to include one or more circumferential projections (28, 30). The cap (14) is formed to include depressions (32, 34) adapted to mate with the projections (28, 30) upon full insertion of the plug portion (36) to create the 'locked' seal. The cap (14) is secured to the tube body (12) by a hinge (38) and a tab (40). The primary usage of the locking microcentrifuge tube (10) is in biomedical laboratory analysis. The tube (10) may be manufactured in various volumes and shapes to adapt to different microcentrifuges and desired sample sizes.

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San Jose, CA, United States of America

Thomas Robert Sutton