Evonik Degussa Gmbh

Thomas Riethmann

Manfred Neumann

Rolf Schneider

Michael Keup

Matthias Seiler

Axel Kobus

Hermann Winkler

Wolfgang Benesch

Jörn Rolker

Daniel Dembkowski

Bernd Glöckler

Helmut Brüggemann

Jens Reich

Jöm Rolker

COis absorbed from a gas mixture by bringing the gas mixture into contact with an absorbent that comprises water and at least one amine of the formula (I), wherein Rand R, independently of each other, are hydrogen or an alkyl group. According to the invention, absorption media comprise sulfolane or an ionic liquid in addition to water and an amine of the formula (I). A device according to the invention for removing COfrom a gas mixture comprises an absorption unit, a desorption unit, and an absorption medium according to the invention that is conducted in the circuit.

[object Object]

COis absorbed from a gas mixture by bringing the gas mixture into contact with an absorbent that comprises water and at least one amine of the formula (I), wherein Rand R, independently of each other, are hydrogen or an alkyl group. According to the invention, absorption media comprise sulfolane or an ionic liquid in addition to water and an amine of the formula (1). A device according to the invention for removing COfrom a gas mixture comprises an absorption unit, a desorption unit, and an absorption medium according to the invention that is conducted in the circuit.

COis absorbed from a gas mixture by bringing the gas mixture into contact with an absorbent that comprises water and at least one amine of the formula (I), wherein Rand R, independently of each other, are hydrogen or an alkyl group. According to the invention, absorption media comprise sulfolane or an ionic liquid in addition to water and an amine of the formula (I). A device according to the invention for removing COfrom a gas mixture comprises an absorption unit, a desorption unit, and an absorption medium according to the invention that is conducted in the circuit. 

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Essen, Germany

Thomas Riethmann