Leica Mikrosysteme Gmbh

Thomas Pfeifer

Heinz Plank

Rainer Wogritsch

Leander Gaechter

Günther Bock

The invention relates to a sample transfer device () for reception of a sample, having a transfer rod () that is configured for reception of a sample holder, the sample holder to be arranged in a chamber () of the sample transfer device () for the purpose of transferring the sample to a processing unit or analytical unit (), at least one measurement device () for measuring a physical variable being arranged inside the sample transfer device ().

Sample transfer device

The invention relates to a cooling apparatus () for a sample in an ion beam etching process, including, a sample stage () for arranging the sample, a coolant receptacle () containing a coolant, at least one thermal conduction element () that connects the sample stage () to the coolant, a cooling finger () connected to the thermal conduction element (), the cooling finger () comprising a conduit () through which coolant can flow and which is connectable to the coolant receptacle (). The invention further relates to a method of adjusting the temperature of a sample in an ion beam etching process, including mounting a sample on a coolable sample stage (), aligning the sample on the sample stage (), and cooling the sample by coolant directed through a conduit () of a cooling finger.

Apparatus for cooling samples during ion beam preparation

A sample stage for processing a sample in an ion beam etching apparatus has positioning arrangements each having a receiving apparatus and a mask, a sample being mountable in the receiving apparatus with reference to an ion beam and positionable relative to the mask. The sample stage includes a mechanism that enables a switchover between respective positioning arrangements so a selected positioning arrangement is respectively orientable toward the ion beam. The sample in the selected positioning arrangement is exposed to the ion beam while the remaining positioning arrangements face away from the ion beam. The positioning arrangements are arranged in one common vessel. A method for sequential preparation of at least two samples in an ion beam etching unit using the sample stage is also disclosed.

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Zschopau, Germany

Thomas Pfeifer