Koninklijke Philips Corporation N.v.

Asml Netherlands B.v.

Asm Lithography B.v.

2ndair B.v.

Thomas Petrus Hendricus Warmerdam

Hans Butler

Rieko Verhagen

Jan Van Eijk

Hubert Gerard Jean Joseph Amaury Vroomen

Frank Johannes Jacobus Van Boxtel

Jan Steven Christiaan Westerlaken

Johan Cornelis Compter

Theo Anjes Maria Ruijl

Frank Anton Van Abeelen

Victor Martinus Gerardus Van Acht

Marius Iosif Boamfa

Arnoldus Johannes Martinus Jozeph Ras

Günes Nakiboglu

Jeroen Dekkers

Joldert Maria Boersma

Robertus Mathijs Gerardus Rijs

Boon Teck Tan

Antonius Johannes Joseph Wismans

Kiran Kumar Thumma

Arjan Franklin Bakker

Luck Wee Png

Angelo Cesar Peter De Klerk

Timotheus Johannes Maria Van Aken

Silvester Matheus Reijnders

Yao Hean Chiah

Dennis Erwin Bos

Michael Johannes Vervoordeldonk

Wee Ann Chong

Rico Paolo Ochoa Ramirez

Franciscus Martinus Roes

Johannes Pieter Kroes

Palani Pandurangan

Robertus Wilhelmus Jacobus Hollering

Sergio Hernandez-Marin

Mun Kong Soo

Joo Pheng Toh

Prakash S S

Joris Pieter Oosterhuis

Eric Gerard Marie Van Kempen

Giorgos Mazarakis

Nuno Filipe Baltazar Dos Santos

The invention relates to a portable textile treatment device comprising a heatable soleplate () intended to be in contact with a textile (TXT) for treating the textile. The heatable soleplate () comprises a soleplate opening (H). The device comprises a module (MD) comprising an image sensor () for taking an image of the textile to be treated through the soleplate opening (H), and a control unit () configured for a) executing an algorithm stored in said portable textile treatment device, using the taken image as an input of the algorithm, to obtain a classification of the textile, and for b) controlling, based on the classification, at least one operating parameter of the portable textile treatment device. The module (MD) and the control unit () are integrated within the portable textile treatment device. The image sensor comprises an active surface sensitive to light which is oriented with respect to the surface of the heatable soleplate (), with an absolute value of an orientation angle being in the range from 15 to 70 degrees. The portable textile treatment device further comprises thermal insulation means arranged in-between the heatable soleplate () and the module (MD) for insulating the module (MD) from heat dissipated by the heatable soleplate ().

Portable textile treatment device with image sensor and thermal insulation means

A lithographic apparatus including: a projection system with an optical axis; an enclosure with an ambient gas; and a physical component accommodated in the enclosure, wherein: the lithographic apparatus is configured to cause the physical component to undergo movement relative to the enclosure, in a predetermined direction and in a plane perpendicular to the optical axis; the lithographic apparatus is configured to let the physical component maintain a predetermined orientation with respect to the enclosure during the movement; the movement induces a flow of the ambient gas relative to the component; the physical component has a surface oriented perpendicularly to the optical axis; the component includes a flow direction system configured to direct the flow of ambient gas away from the surface.

Lithographic apparatus and device manufacturing method

The invention relates to a suction unit and relates to a vacuum cleaner. The suction unit comprises a drive system for driving the suction unit over a surface to be treated; a chassis supporting the drive system; a nozzle for removing particles from a surface to be treated which nozzle is configured to move with relation to the chassis in a direction away from the surface to be treated, the nozzle having an interior space defining an opening that faces the surface to be treated; and an outlet communicating with the interior space, the outlet being arranged for communication with a fan unit in operating conditions. The suction unit further comprises coupling means for coupling the nozzle to the chassis, wherein the coupling means is arranged to exert a force that is directed away from the surface to be treated when the under pressure in the interior space increases. In this manner the problem of the suction unit getting stuck on the floor can be overcome or at least be reduced. Furthermore the traction of the drive system can be improved. An autonomous vacuum cleaner according to the invention comprises such a suction unit and further comprises a dust chamber, and a fan unit that communicates with the dust chamber, the fan unit communicating with the outlet for creating under pressure in the interior space of the nozzle in operating conditions.

Suction unit and autonomous vacuum cleaner

The air-conditioning system comprises a dryer () comprising a membrane contactor () provided with a first channel () for air flow and a second channel () for desiccant flow, which channels are separated through a membrane (). The air conditioning system further comprises a humidifier () comprising a membrane contactor. The air flow passes in operation the dryer () and the humidifier () between an inlet () and an outlet (). The dryer () comprises a series connection of a heat exchanger () and the membrane contactor (), which heat exchanger couples air flow from the inlet () with desiccant flow from a regenerator () and in which membrane contactor () the thus heat-exchanged air flow and the heat-exchanged desiccant flow are coupled for drying of the airflow.

Air-conditioning system and use thereof

System for and method of active vibration isolation to isolate a payload () from earth movements. The system has a body (), a mass () supported by the body () by means of at least one spring (), a further mass () supported by the mass () by means of at least one further spring (). A sensor senses a distance between the mass () and the further mass () and generates a distance signal. A controller () receives the distance signal and generates a control signal based on the distance signal. An actuator () actuates a position of said mass () based on the control signal, whereas the further mass supports the payload to be isolated from earth ().

Actuator arrangement for active vibration isolation using a payload as an inertial reference mass

A apparatus processes an object (), such as a semi-conductor wafer at accurately controlled positions. The object () is supported by a working platform () that is moveable along a path. A suspension actuator part () attached to the working platform (), contains a soft magnetic core () with poles facing the surface of a soft magnetic element () on the support structure along the path and a winding () for application of a current to generate a magnetic field that runs through the core () v the poles and returns via the soft magnetic element (). A sensor () senses a measured position of the suspension actuator part () relative to the position reference element (). A control circuit comprises an outer control circuit () and an inner control circuit (). The outer control circuit () receives a sensing result and determines force set point information to regulate the measured position of the actuator part () to a required value. The inner control circuit () receives the force set point information and controls the current to realize a force between the actuator part () and the support structure () according to the force set point information.

Apparatus for processing an object with high position accurancy

A lithographic projection apparatus has a radiation system for supplying a projection beam of radiation, a mask table provided with a mask holder for holding a mask, a substrate table provided with a substrate holder for holding a substrate, a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate, first driving means, for moving the mask table in a given reference direction substantially parallel to the plane of the table, second driving means, for moving the substrate table parallel to the reference direction so as to be synchronous with the motion of the mask table. The lithographic projection apparatus also has a first measuring means, for determining the momentary position of the mask table with respect to a fixed reference point, second measuring means, for determining the momentary position of the substrate table with respect to a fixed reference point, and means for comparing the measured momentary position of the substrate table with a desired momentary position of the substrate table for generating a position error signal in accordance with a difference between the said two positions, and for passing that signal to correction means which serve to adjust the momentary position of the mask table so as to compensate for such difference. In a preferred embodiment, at least a portion of the position error signal is differentiated twice with respect to time before being passed to the correction means, thus providing the correction means with an acceleration error signal which can then be used to directly effect the required correctional acceleration of the mask table.

Lithographic projection apparatus

Growing community of inventors

Veldhoven, Netherlands

Thomas Petrus Hendricus Warmerdam