Cytec Technology Corporation

Ciba Specialty Chemicals Corporation

Cytec Industries Inc.

Thomas P Sassi

Ram Baboo Gupta

Alan S Rothenberg

Dennis John Jakiela

Haunn-Lin Tony Chen

Lino Giovanni Magliocco

Gottfried Haacke

Morris E Lewellyn

Balwant Singh

John F Stephen

Laurence W Chang

Donald H Valentine, Jr

Lino G Magliocco

The present invention relates to processes for reducing or eliminating the amount of hydrazine from a hydroxylamine-free base containing hydrazine by treating said hydroxylamine-free base with a scavenger agent, and to the hydroxylamine-free base thereby obtained, as well as to its use for producing microdispersions containing a hydroxamated polymer for use as a flocculant in the Bayer process.

Process for removing hydrazine from hydroxlyamine solutions

Methods of producing microdispersions containing hydroxamated polymers by reacting water-in-oil microdispersions having vinyl polymers containing one or more pendant functional groups that react with hydroxylamine, with a hydroxylamine-free base substantially free of inorganic salt and containing less than 500 ppm hydrazine are disclosed herein, along with the microdispersions thereby obtained.

Microdispersions of hydroxamated polymers and methods of making and using them

Polymeric articles containing at least one polymeric material and a sufficient amount of at least one novel hindered amine light stabilizers to inhibit at least one of photo- or thermal degradation. The hindered amine light stabilizer may be a monomeric or an oligomeric hindered amine light stabilizer.

Polymeric articles containing hindered amine light stabilizers based on multi-functional carbonyl compounds

Oligomeric hindered amine light stabilizers based on multi-functional carbonyl compounds and methods of making same

The present invention relates to novel bisbenzophenones and the use thereof as an ultraviolet light absorber. The presently claimed compounds are particularly useful, either alone or in combination with other additives, including other ultraviolet light absorbers, antioxidants and stabilizers, in stabilizing polymers and other materials from degradation by environmental forces such as actinic radiation (ultraviolet light), oxidation, moisture, atmospheric pollutants and combinations thereof.

Bis(alkyleneoxybenzophenone) ultraviolet light absorbers

Hindered amine light stabilizers based on multi-functional carbonyl compounds and methods of making same

This invention relates generally to amido or carbamate substituted trisaryl-1,3,5-triazines and the use thereof to protect against degradation by environmental forces, inclusive of ultraviolet light, actinic radiation, oxidation, moisture, atmospheric pollutants and combinations thereof. The new class of trisaryl-1,3,5-triazines comprises an aryl ring attached to the triazine ring (and preferably an aryl ring containing a hydroxyl group, either free or blocked to form a latent stabilizer, ortho- to the point of attachment to the triazine ring) substituted with a group comprising a bondable amido/carbamate containing group para- to the point of attachment to the triazine ring. These materials may, under the appropriate circumstances, be bonded to formulations comprising coatings, polymers, resins, organic compounds and the like via reaction of the bondable functionality with the materials of the formulation. A method for stabilizing a material by incorporating such amido or carbamate substituted trisaryl-1,3,5-triazines is also disclosed.

Trisaryl-1,3,5-triazine ultraviolet light absorbers

Provided is a composition which contains a mono- or bis-benzotriazole compound, an N-oxide thereof, or a mixture of at least two of the preceding compounds. Representative bis-benzotriazole compounds include 3,3&prime;-bis-(2H-benzotriazol-2-yl)-5,5&prime;-di-tert-octyl-1,1&prime;-biphenyl-2,2&prime;-diols. Representative mono-benzotriazole compounds include 3-(2H-benzotriazol-2-yl)-5,5&prime;-di-tert-octyl-1,1&prime;-biphenyl-2,2&prime;-diols. These mono- and bis-benzotriazole compounds are useful as stabilizers of degradable polymers against the degradative action of ultraviolet light. Also provided is a method of making these benzotriazole compounds by oxidative dimerization of the corresponding monomeric benzotriazole or by reductive cyclization of the corresponding azo- compound.

Mono- and bis-benzotriazolyldihydroxybiaryl UV absorbers

Novel mono- and bis-benzothiazole sulfenamide compounds based on primary amines are provided which may be employed as rubber vulcanization accelerators having excellent scorch safety. Vulcanizable rubber compositions containing rubber, sulfur and the novel benzothiazole sulfenamide compounds are also provided.

Growing community of inventors

Stamford, CT, United States of America

Thomas P Sassi