Carl Zeiss Smt Gmbh

Thomas Okon

Toralf Gruner

Wilhelm Ulrich

Alexander Epple

Aurelian Dodoc

Heiko Feldmann

Norbert Wabra

Daniel Kraehmer

Boris Bittner

Olaf Conradi

Vladimir Kamenov

Julian Kaller

Volker Graeschus

Jean-Claude Perrin

Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.

Microlithography projection objective

A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hH to marginal ray height hR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hH to marginal ray height hR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.

Method for correcting a lithography projection objective, and such a projection objective

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Aalen, Germany

Thomas Okon