Von Ardenne Gmbh

Von Ardenne Anlagentechnik Gmbh

Von Ardenne Asset Gmbh &co. Kg

Thomas Meyer

Torsten Dsaak

Michael Hofmann

Michael Hentschel

Steffen Mosshammer

Hans-Christian Hecht

Reinhardt Bauer

Hubertus Von Der Waydbrink

Matthias Smolke

Daniel Stange

Ralf Biedermann

Bernd Teichert

Jan Kircheis

Andreas Heisig

Andrej Wolf

Michael Brandt

Marco Kenne

Hubertus Von Der Waybrink

Steffen Grosser

According to various aspects of the disclosure, a valve assembly for a vacuum chamber housing may have: a valve housing, which has a substrate transfer gap; a valve flap, which is mounted so as to be rotatable about an axis of rotation, thus enabling said flap to be rotated into a first position and into a second position, wherein the axis of rotation is arranged in the substrate transfer gap, and wherein the substrate transfer gap is extended longitudinally along the axis of rotation; wherein the valve flap closes the substrate transfer gap in the first position and is arranged adjacent to the substrate transfer gap in the second position.

Valve assembly, vacuum assembly and method

In various aspects of the disclosure, a method of operating a process group that performs at least a first reactive coating process and a second reactive coating process may comprise: coating of a substrate by means of the first reactive coating process and by means of the second reactive coating process; closed-loop control of the process group by means of a first manipulated variable of the first coating process and a second manipulated variable of the second coating process and using a correction element; wherein the correction element relates the first manipulated variable and the second manipulated variable to one another in such a way that their control values are different from one another.

Method and control device

According to various embodiments, a vacuum arrangement may comprise the following: a first dehydration chamber and a second dehydration chamber, which are gas-separated from one another; a substrate transfer chamber for changing clocked substrate transport into continuous substrate transport towards the second dehydration chamber; a first high-vacuum pump of gas-transfer type for evacuating the first dehydration chamber; and a second high-vacuum pump of gas-binding type for evacuating the second dehydration chamber; wherein the first dehydration chamber is, with respect to the substrate transport, arranged between the second dehydration chamber and the substrate transfer chamber.

Vacuum arrangement and method

According to various embodiments, a transporting device may comprise: a plurality of transporting rollers, of which at least two transporting rollers comprises: a glass tube mounted rotatably about an axis of rotation; the glass tube being joined together from a plurality of tube segments, a first tube segment of which is arranged between two second tube segments; and the first tube segment having a plurality of portions, the circumferential surfaces of which are surfaces of rotation with respect to the axis of rotation and/or are arranged coaxially; the plurality of transporting rollers providing by means of the circumferential surfaces a transporting surface for transporting a substrate in plate form and/or in strip form.

Transporting device, vacuum arrangement, transporting roller and method

In a substrate treatment process, substrates are moved by a transporting device in a transporting direction through a substrate treatment installation having a number of chambers. The substrates are moved by transporting sections of the transporting device driven independently of one another. The transporting sections are driven such that, if substrates dwell temporarily in the transporting section, they are moved back and forth. Stresses in a substrate brought about by differing inputs of heat as a result of both process-induced and malfunction-induced dwell times of the substrate in a chamber are reduced by compensating within the chamber for a structurally brought about input of heat into the substrate, varying periodically over the length of the chamber, during temporary dwelling of the substrate in the chamber by moving the substrate back and forth over at least one period of the heat input by a change of the transporting direction.

Substrate treatment process

A substrate treatment plant includes a process chamber delimited by chamber walls and in the process chamber a substrate conveying unit for the horizontal conveyance of slab-shaped substrates in one conveying plane and in one conveying direction. The substrate conveying unit includes an arrangement of rotatably mounted, cylindrical conveying rollers transversely arranged to the conveying direction, the topmost generatrices of the conveying rollers defining the conveying plane, and at least one substrate treatment unit, which is located above the conveying plane, and at least one gas inlet. In the region of the substrate treatment unit at least one additional heating unit is located below the conveying plane and a condensation unit is located under the substrate conveying unit.

Continuous substrate treatment plant and cleaning method

A conveying roller for a horizontal continuous substrate treatment plant, has a roller body with two ends and two end caps having a receiving opening. Each end of the roller body is arranged in a receiving opening of an end cap. The end cap has two end cap parts which can be releasably connected to one another and which jointly form the receiving opening. The receiving opening is larger than the outside diameter of the end of the roller body. At least two elastic rings which center the roller body in the receiving opening are arranged on the end of the roller body.

Transport roller and transport device for a horizontal continuous substrate treatment apparatus

A transport cylinder for the vacuum treatment of substrates includes a roll body and at least one spacer element arranged on the roll body and enveloping the roll body. The spacer element is made of a knitted tube containing metallic or/and metallic threads.

Transport roller for the vacuum treatment of substrates

A substrate-treatment installation includes a vacuum chamber, a substrate treatment device within the vacuum chamber, a substrate transport device within the vacuum chamber for guiding a substrate along a longitudinal direction in a substrate transport plane past the substrate treatment device, and a device for controlling substrate temperature. The substrate temperature controlling device includes a heat-absorbing cooler on one side of the substrate transport plane and an insulation member selectively displaceable between at least two different positions to vary extent of thermal shielding of the heat-absorbing cooler relative to the substrate transport plane by the insulation member.

Substrate treatment installation with adjustable thermal insulation for controlling substrate temperature

A surface heating device for a substrate treatment device with increased power density and improved homogeneity of heat radiation includes a jacket tube heater with straight tube sections and bent tube sections in which straight tube sections are arranged parallel to each other in a main plane and straight tube sections are connected to each other by bent tube sections, so that at least part of the bent tube sections are aligned sloped relative to the main plane.

Surface heating device for a substrate treatment device and substrate treatment device

A method for measuring the temperature of substrates to be coated is disclosed. The substrates have an opening or a cavity, and the substrates are successively moved past a source of coating material. At least one substrate's temperature is measured during coating by at least one temperature sensor and the measured temperature value is transmitted to a measuring device. The temperature sensor is disposed inside the substrate's opening or cavity so as to prevent coating of the temperature sensor.

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Dresden, Germany

Thomas Meyer