Shipley Company LLC

Rohm & Haas Electronic Materials LLC

Cubist Pharmaceuticals, Incorporated

Thomas M Zydowsky

Roger F Sinta

James W Thackeray

Timothy G Adams

Edward K Pavelchek

Rosemary Bell

James Michael Mori

Robin L Miller-Fahey

James F Cameron

Manuel doCanto

Youe-Kong Shue

Jason M Hill

Manual doCanto

Guixue Yu

Julius Rebek

The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.

Dyed photoresists and methods and articles of manufacture comprising same

This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that generate an &#x3b1;,&#x3b1;-difluoroalkyl sulfonic acid upon exposure to activating radiation. Positive- and negative-acting chemically amplified resists that contain such PAGs are particularly preferred. The invention also includes methods for synthesis of such PAGs and &#x3b1;,&#x3b1;-difluoroalkyl sulfonic acids.

Photoacid generators and photoresists comprising same

The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a low molecular weight anthracene dye compounds. It has been found that these dye compounds can significantly reduce or even eliminate undesired reflections of exposure radiation, particularly deep U.V. exposure radiation such as 248 nm, as well as function as effective sensitizer compounds, enabling effective imaging at higher wavelengths, particularly I-line exposures.

Certain novel aminoacyl adenylate mimics are described. An exemplary compound of this invention is �S-(R*,R*)!-3,6-anhydro-1,2-dideoxy-1-�5-�4-�(5-nitro-2-thienyl)ethynyl!ph enyl!-2H-tetrazol-2-yl!-D-allo-heptitol 7-(2-amino-3-methyl-1-oxopentyl)sulfamate. These compounds inhibit isoleucyl-tRNA synthetases and are useful as antimicrobial and antiparasitic agents.

Aminoacyl adenylate mimics as novel antimicrobial and antiparasitic

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Cambridge, MA, United States of America

Thomas M Zydowsky