Liveoak Technologies, Inc.

Other

Advanced Micro Devices Corporation

Advanced Micro Device, Inc.

Thomas M Brown

Peter Rung

Andrew Ambrose

Peter A Burke

Edward Outlaw Travis, Jr

Christopher H Raeder

Jeffrey C Haines

Richard A Wilkinson

Stephen W Hymes

A computer-implemented online conferencing transactional platform system comprising an interaction module, a video-conferencing module, and a storage device may allow multiple participants in a video-conference to access, co-browse, collaboratively edit, and sign a transactional document. An interaction module fetches an image of a transactional document and a field identifier for an interactive transactional document element to be filled out from a remotely-connected secure signature API, and displays the image of the document, along with the interactive transactional document element on a webpage interface to a moderator and a signer end user in a video-conference. The interaction module receives a filled-out transactional document in an I-frame from the secure signature API, allowing the signer end user to sign the transactional document using a secure embedded signature process.

Online conference system with real-time document transaction platform

A model-based approach for generating an etch pattern to decrease topographical uniformity involves placing reverse dummy features ( ) in a region of a semiconductor substrate ( ) according to the topography of the region and adjacent regions. The reverse dummy features are placed inconsistently over the semiconductor substrate ( ) because the need for reverse dummy features is inconsistent and varies from design to design. In one embodiment, the reverse dummy features ( ) having varying widths are placed with varying spacing between them and are placed in different regions. The determination of location, size and spacing of the reverse dummy features ( ) is determined based upon the uniformity effect over the entire semiconductor die and may be used in conjunction with the placement of printed dummy features. After placing the reverse dummy features ( ), a planarization process may be performed to remove the reverse dummy features, which improves the planarization.

Semiconductor device and process for generating an etch pattern

A method is provided for selectively electrochemically depositing copper. The method includes forming a layer of dielectric material above a structure layer, forming a conductive layer above the layer of dielectric material and forming an opening in the conductive layer and the layer of dielectric material. The method also includes selectively forming at least one barrier metal layer and a copper seed layer only in the opening, the at least one barrier metal layer and the copper seed layer being conductively coupled to the conductive layer. The method further includes forming an insulating layer above the conductive layer, and selectively electrochemically depositing copper only in the opening.

Site-selective electrochemical deposition of copper

The present disclosure relates to a chemical mechanical polishing apparatus used for polishing wafers. The apparatus includes a polish platen and structure for separating the platen into at least first and second zones such that polishing fluid used in the first zone is prevented from entering the second zone.

Chemical mechanical polish platen and method of use

A method for measuring the planarization efficiency of a planarization process and a device for use with the method are provided. The device may be a substrate having a set of isolated features, such as trenches or hills, with different widths. In the method, a removable layer of material is formed over the substrate. The substrate features form corresponding features in the removable layer with varying dimensions. A pre-planarization thickness of the removable layer of material is measured at each feature and at one or more of isolation areas. The removable layer of material is then planarized using a planarization process associated with one or more process parameters. A post-planarization thickness of the removable is measured at each feature and at one or more of the isolation regions. The planarization efficiency of the planarization process is then determined as a function of the dimensions of the substrate features or corresponding features in the removable layers and/or one or more process parameters. The determined planarization efficiency may be output by, for example, generating a graph of the planarization efficiency or using the planarization efficiency to change one or more parameters of the planarization process.

Method for determining the efficiency of a planarization process

Described briefly, according to a typical embodiment of the present invention, a breathing mask is provided which has the intake air heater and heat and moisture exchange media located below the nose and situated for minimum exposure to heat transfer to the exterior. The mounting thereof is somewhat cantilevered from the mask, to minimize direct heat transfer to the exterior. Electric heating element means are provided and supplied from an energy pack mounted in the mask itself at a relatively low level. Some of the inhaled air passes through a first filter and moisture collecting medium to the mouth and/or nose of the individual wearing the mask. All inhaled air passes through a heat exchanger and a second filter and moisture exchanger. A valve is provided so that all air exhaled during normal respiration passes through both of the moisture exchangers. A second valve is provided in the wall of the mask to permit exhalation of any air exceeding that which can get through both of the exchangers during strenuous exercise and unusually high rates of respiration.

Cold weather face mask

A frigid air respirator comprising a cylindrical housing affixed to a face mask, openly constructed so as to permit the passage of air upon inhalation by the user into the chamber formed by the housing. A heating means is situated within the housing to increase the temperature of incoming air by radiation and a transversely positioned intake valve governs the admission of air into the respiratory tract of the user and divides the chamber formed by the housing into an internal chamber which is contiguous with the mask cavity and into a receiving chamber wherein a supply of previously heated air is stored prior to inhalation. An exhaust valve is encompassed into the device to allow the expulsion of air from the internal chamber and mask cavity.

Growing community of inventors

Austin, TX, United States of America

Thomas M Brown