Schott Ag

Thomas Kuepper

Lars Bewig

Christoph Moelle

Stefan Bauer

Lutz Zogg

Andree Mehrtens

Stefan Geisler

Frank Koppe

Christian Henn

Wolfram Maring

Wolfgang Moehl

Juergen Dzick

Rolf Meyer

Dieter Wittenberg

Thomas Niklos

Christopher Moelle

Reinhard Henze

Thomas Wenzel

Lars Brandt

In the case of CVD methods, comprising PECVD and PICVD methods, the aim of the invention is to improve the impurity-free and, as far as possible, temporally and quantitatively precise feeding of process gases for the targeted layer systems. To this end, the invention provides a coating system and a method for coating articles with alternating layers, in the case of which process gases are introduced in an alternating fashion into a gas mixing point and mixed with a further gas and led to the reaction chamber, in which the deposition is carried out by producing a plasma.

Coating system and method for coating, as well as coated articles

A method and apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas. The electromagnetic energy is radiated in by a multiplicity of pulse sequences, preferably microwave or radiofrequency pulses, with a multiplicity of pulses spaced apart temporally by first intermissions, wherein the electromagnetic energy radiated in is turned off in the intermissions, and wherein the intermissions between the pulse sequences are at least a factor of 3, preferably at least a factor of 5, longer than the first intermissions between the pulses within a pulse sequence.

Method and apparatus for plasma enhanced chemical vapor deposition

The invention relates to layer systems having at least one layer comprising titanium aluminum oxide. The layer comprising titanium aluminum oxide may be either a functional layer&#x2014;with or without interruption by an intermediate layer which is optically inactive&#x2014;or a functional layer formed from a metal oxide which is interrupted by an intermediate layer comprising titanium aluminum oxide. The layer systems are structurally and thermally stable at operating temperatures of over 600&#xb0; C. The layer systems may either comprise only one functional layer or may be a multilayer system, preferably an alternating layer system composed of functional layers with high and low refractive indices.

Layer system

The invention provides a process for producing at least one optical filter layer segment on a substrate. The process includes The deposition of the optical filter layer, at least at times, takes place at a temperature of over 150&#xb0; C., preferably in a range from over 150&#xb0; C. up to and including 400&#xb0; C.

Process for producing patterned optical filter layers on substrates

A method of producing substrates with functional layers which have high optical properties and/or a high surface smoothness, in particular a low turbidity and significantly lower roughness, is provided. The method includes a sputtering process for coating a substrate with at least one functional layer, the sputtering process being interrupted at least once by the application of an intermediate layer with a thickness of less than 20 nm.

Process for producing layers and layer systems, and coated substrate

The invention provides a process for producing a high-precision reflector and its coating. A reflector is produced from a solid material using a material-removing process and is coated with a cold-light mirror layer.

Metal reflector and process for producing it

In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOand SiOby means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100&#xb0; to 400&#xb0; C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.

Method for coating the quartz burner of an HID lamp

The reflector for a light of higher power has a base body made of glass or glass ceramic and a protective jacket provided on the outer surface of the base body. The base body is formed with a receptacle for a light source, especially a gas discharge lamp, and an interior mirror surface for reflecting light. The protective jacket includes a mat or is a mat-shaped body, i.e. a woven or knit textile fabric of natural or synthetic material. Preferably it is a glass-fiber-reinforced mat. In addition to preventing splinters from flying around, the protective jacket advantageously also provides temperature equalization throughout the reflector. It also helps to prevent scattered light. The protective mat or jacket may be attached to the base body with an adhesive, such as a water glass.

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Bad Gandersheim, Germany

Thomas Kuepper