Leybold Aktiengesellschaft

Toppan Printing Co., Ltd.

Thomas Krug

Eggo Sichmann

Mitsuru Kano

Mamoru Sekiguchi

Andreas Meier

Klemens Ruebsam

Gerhard Steiniger

Takashi Miyamoto

Noboru Sasaki

Hans Kessler

Jochen Heinz

Wolfgang Buschbeck

Mika Gamo

Helmut Grimm

Friedrich Anderle

Siegfried Kleyer

Wolf-Eckart Fritsche

Dan L Costescu

Nobuhiko Imai

Albert Feuerstein

Hiroyuki Yasujima

Martin Pollmann

Stephan Kempf

Jurgen Meinel

Klemens Rubsam

A DC source 10 connected to an electrode 5 is disposed in a coating chamber which can be evacuated. The electrode is electrically connected to a target 3 which is sputtered and the sputtered particles are deposited on the substrate, while a process gas is introduced in the coating chamber 15, 15a. The target is made of an aluminum-silicon alloy which may contain 0.5 to 2.0 percent silicon and 99.5 to 98.0 percent aluminum in order to improve the adhesive strength and the service life of the layer 2. The substrate may be made of polycarbonate.

Process for coating a polycarbonate substrate with an aluminum-silicon

A wetting unit provides a contact agent between the coating roll and the film surface before coating by a thermal source.

Apparatus and method for cooling films coated in a vacuum

This invention relates to a source material for vapor deposition, which is useful for forming a magnesium oxide thin film by vacuum vapor deposition process, and to a method of forming a transparent barrier film by using the magnesium oxide source material. The source material is composed of a magnesium oxide having a bulk density of 2.5 g/ml or more. This magnesium oxide can be obtained by sintering or fusing magnesium oxide material. For producing a transparent barrier film having a gas barrier property, this magnesium oxide is vapor-deposited on a surface of a transparent plastic base film by means of vacuum vapor deposition. The volume shrinkage or cracking of the evaporation source material can be avoided, thereby stabilizing the evaporation and prolonging duration of the evaporation. Further, it is possible to utilize a high power of electron beam. Since the evaporation source material is substantially free from pore, the evacuation of gas from the evaporation apparatus can be finished within a short period of time, and the vacuum degree within the evaporation apparatus can be stabilized. Since there is no splash or scattering during the evaporation., a transparent barrier film which is uniform in thickness and free from pinhole can be obtained.

Evaporation method of forming transparent barrier film

The invention relates to a vacuum coating installation comprising a container (9) in which is disposed the material (10) to be vaporized, for example SiO. The vaporization of the material (10) herein takes place by means of an electron beam gun (11) or by means of a vaporization oven. Opposing the surface of the material to be vaporized (10) is provided a synthetic film (5) to be coated which is transported further by means of a transport arrangement (4, 6, 22 to 27). Into the space between the material (10) to be vaporized and the material (5) to be coated a microwave is irradiated from an horn antenna (13).

Vacuum coating installation

The invention relates to a method for the aftertreatment of an oxide coating, and specifically an SiO.sub.x coating on a synthetic film. In this aftertreatment the oxide coating is exposed to a plasma whose particles effect positive changes of the oxide coating.

Method for treating an oxide coating

A crucible (9) of a nonmetallic material with an elongated cavity (42) to contain the material to be evaporated has on top a vapor emission slot (45) which is defined at its longitudinal edges (43, 44) by two elongated plates (40, 41) of a likewise nonmetallic material. In the cavity (42) two heating rods (46, 47) are disposed in a mirror-symmetrical relationship to a plane of symmetry (S) through the vapor emission slot (45), one under each of the plates (40, 41) defining the vapor emission slot (45). Additional heating means are provided outside of the crucible and inside of a thermal barrier system.

Linear thermal evaporator for vacuum vapor depositing apparatus

In a device for coating a substrate 1 made of polymethylmethacrylate with aluminum by means of a direct current source 10 which is connected to an electrode 5 disposed in an evacuable coating chamber 15a and electrically connected to a target 3 to be sputtered and the sputtered particles are deposited on a substrate 1 and wherein a process gas is introduced into the coating chamber (15, 15a), helium has is introduced as a process gas in order to improve adhesiveness and service life 2.

Method for coating polymethylmethacrylate substrate with aluminum

A series evaporator for vacuum vapor-deposition apparatus has several evaporators 5 with individual power control, heated by passing through a current, supported on column-like, electrical supply lines 3, 4 wherein the column-like supply lines 3, 4 are held by an electrically conductive support body 6 extending over the entire length of the series evaporator. The supply lines 3 of the one polarity are connected to the support body 6 in an electrically conductive manner whereas the supply lines 4 of the other polarity are passed through the support body 6 in an insulated manner and connected to conducting wires 7 disposed in an insulated manner. Spring elements 8 apply pressure to the supply lines 4 traversing the support body 6 with play a, b, the action of these spring elements being exerted approximately parallel to the longitudinal extension of the evaporator and pressing the top portions 9 of the supply lines 4 against the front surfaces 10 of the evaporator 5 which they face. The spring elements themselves are held and guided in an insulating manner with respect to the support bodies 6 or are made of an insulating material, and the conducting wires 7 connected to these supply lines 4 are conductors passed through by a coolant or are configured as cooling tubes 11 or cooling pipes running parallel to the conducting wires and discharging into chambers or channels 12 provided in the supply lines 4.

Series evaporator for vacuum vapor-deposition apparatus

A DC source 10 is connected to an electrode 5 disposed in a coating chamber 15a which can be evacuated and this electrode is electrically connected to an aluminum target 3 which is sputtered by introduction of a process gas and the sputtered particles deposited onto a plastic substrate. During the coating process hydrogen and/or water vapor are supplied to the cathode area from a container 32 via a system of pipes 30 to increase the adhesive strength of the sputtered layer 2 on the substrate 1.

Process for coating a substrate with electrically conductive materials

In a device for producing metal-free strips on vacuum-coated film webs, particularly for capacitors, including a casing 32 with a cover 30 for sealing the casing pressure-tight and a winding unit 29, including guiding and tensioning rollers 5 to 17 which are rotatably disposed between the plates 3, 4, at least one coating roller and a take-off and a take-up roller 35', 37' as well as a coating source 19 supported in the casing 32 and a preferably tubular vessel 34 for receiving a separating agent 33 to be evaporated, for example oil, which is disposed transversely to the running direction of the web and has at least one nozzle 36 for the separating agent 33 to emerge from the vessel 34 onto the film web 50 passing by the outlet nozzle 36 in direct vicinity, the vessel 34 is at least partially filled with a supply of separating agent 33 and is provided with at least one vapor outlet pipe 39 the outlet nozzle of which 36 ends into the coating chamber 45 below the surface level 46 of the supply of separating agent 33 and in direct vicinity of the film web 50 to be coated and the end of vapor outlet pipe 39 which faces away from the nozzle 36 ends in the space 40 of the vessel above the supply of separating agent 33.

Growing community of inventors

Hanau, Germany

Thomas Krug