General Electric Company

Ferro Corporation

Thomas Joseph Coffey

Srinivasan Sridharan

George E Sakoske

Ellen Schwartz Tormey

John J Maloney

Yie-Shein Her

Jackie D Davis

Mohammed H Megherhi

Cody J Gleason

Lei Deng

Stanley Wang

Orville Washington Brown

David L Widlewski

Peter Marley

A low K value, high Q value, low firing dielectric material and method of forming a fired dielectric material. The dielectric material can be fired below 950&#xb0; C. or below 1100&#xb0; C., has a K value of less than about 8 at 10-30 GHz and a Q value of greater than 500 or greater than 1000 at 10-30 GHz. The dielectric material includes, before firing a solids portion including 10-95 wt % or 10-99 wt % silica powder and 5-90 wt % or 1-90 wt % glass component. The glass component includes 50-90 mole % SiO, 5-35 mole % or 0.1-35 mole % BO, 0.1-10 mole % or 0.1-25 mole % AlO, 0.1-10 mole % KO, 0.1-10 mole % NaO, 0.1-20 mole % LiO, 0.1-30 mole % F. The total amount of LiO+NaO+KO is 0.1-30 mole % of the glass component. The silica powder can be amorphous or crystalline.

Low K dielectric compositions for high frequency applications

The present disclosure relates to a discharge lamp able to be operated at less than full rated power without suffering undesirable color shift, loss of lumen maintenance or loss of lamp efficacy. It finds particular application in connection with ceramic metal halide lamps having a low dose level of thallium iodide and optionally indium iodide, e.g. less than 1 mol %, in the dose thereof.

Low T1I/low InI-based dose for dimming with minimal color shift and high performance

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Cleveland Heights, OH, United States of America

Thomas Joseph Coffey