Inpria Corporation

Thomas J Lamkin

Joseph Burton Edson

William Earley

Truman Wambach

Jeremy T Anderson

Benjamin L Clark

Craig M Gates

Dominick Smiddy

Mark Geniza

Joseph B Edson

A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR')or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′)and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn-(NR′COR″), where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are 10 suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods

A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR')or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′)and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″), where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.

Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with low metal contamination and/or particulate contamination, and corresponding methods

A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′)and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″), where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR')or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR&#x2032;)and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R&#x2032; is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn&#x2014;(NR&#x2032;COR&#x2033;), where R is a hydrocarbyl group with 1-31 carbon atoms, and where R&#x2032; and R&#x2033; are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

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Corvallis, OR, United States of America

Thomas J Lamkin