Dexter Chemical Corporation

Thomas Holst, Jr

Gregory J Hopkins

An abrasive structure for stone washing garments in a wash medium and a method for abrading garments using that abrasive structure to achieve controlled abrasion of those garments are disclosed. The abrasive structure has a uniform abrasive surface which will not damage or excessively wear fabrics and garments being subjected to the stone washing method, which will not deteriorate during use, and which will provide uniformly stone washed garments having a consistent nap and a low level amount of textile wear. The abrasive structure is formed of a substantially form-retaining material having a resilient abrasive surface. For example, the abrasive structure may be formed of a block of form-retaining material substantially impervious to aqueous washing systems and a resilient layer of synthetic abrasive material substantially surrounding the block and affixed to the exterior surfaces of the block.

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Charlotte, NC, United States of America

Thomas Holst, Jr