Merck Patent Gesellschaft MIT Beschrankter Haftung

Thomas Herold

Rudolf Klug

Hans J Merrem

Photoresist formulations for forming relief structures from highly heat-resistant polyimide polymers, containing in an organic solvent in essence at least

Polyamide ester photoresist formulations of enhanced sensitivity

Perdeuterated methacrylates of a high degree of deuteration can be obtained by a process for the preparation of perdeuterated methacrylates from hexadeuteroacetone by conversion into the corresponding cyanohydrin, subsequent elimination of water, hydrolysis of the cyano group and esterification with perdeuterated alkanols, the conversion of hexadeuteroacetone into the cyanohydrin being effected by reaction with trimethylsilyl cyanide to give 1,3-hexadeutero-2-(trimethylsiloxy)-2-cyano-propane and subsequent hydrolytic elimination of the trimethylsilyl group.

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Brensbach, Germany

Thomas Herold