Boston University

Other

Massachusetts Institute of Technology

Saudi Arabian Oil Company

Aramco Services Company

Thomas Gary Bifano

Jerome Charles Mertz

Bennett B Goldberg

Devin Robert Beaulieu

Mazen Kanj

Shannon Lee Eichmann

Selim M Unlu

Abdulkadir Yurt

Mark N Horenstein

Hari Prasad Paudel

Euan Ramsay

Devin Beaulieu

Fatih Hakan Koklu

Yang Lu

Christopher Stockbridge

William Shain

Marshall Ma

An exemplary imaging system is provided. The imaging system includes a light source configured to illuminate a plurality of spatially separated regions of a material structure producing a first illumination. A lens produces an image of the spatially separated regions. A lens array magnifies the spatially separated regions of the image. The lens array produces a mosaic image comprised of magnified subimages of each region spatially separated region. A camera sensor to record the image.

High throughput screening system for engineered cardiac tissues

A method for obtaining one or more images of a sample using a microscope includes dividing, using a reverberation cavity, a first one of a plurality of laser pulses into a plurality of sequential sub-pulses, each of the plurality of sequential sub-pulses having a power that is less than a previous one of the plurality of sequential sub-pulses, directing, using the one or more lenses of the microscope, the plurality of sequential sub-pulses onto a portion of the sample to generate a plurality of signals, each of the plurality of signals being associated with a different depth within the sample, and detecting the plurality of signals from the sample to generate one or more images of at least a portion of the sample.

Reverberation microscopy systems and methods

A system and method for correction of aberrations in a solid immersion microscopy system using a deformable mirror. A solid immersion lens is provided having a surface configured to make optical contact with a nearly planar surface of a substrate, an object to be imaged disposed on the opposite side of the substrate. A convex surface of the solid immersion lens faces an objective lens. A deformable mirror assembly, including a plurality of individually controllable actuators, receives light transmitted from the object. A control system controls in communication with the deformable mirror assembly provides individual actuation of each of the actuators of the deformable mirror to compensate or counteract the effects of aberrations.

Solid immersion microscopy system with deformable mirror for correction of aberrations

Embodiments of the invention provide an imaging system and method using adaptive optics and optimization algorithms for imaging through highly scattering media in oil reservoir applications and lab-based petroleum research. Two-/multi-photon fluorescence microscopy is used in conjunction with adaptive optics for enhanced imaging and detection capabilities in scattering reservoir media. Advanced fluorescence techniques are used to allow for super-penetration imaging to compensate for aberrations both in and out of the field of interest, extending the depth at which pore geometry can be imaged within a rock matrix beyond the current capability of confocal microscopy. The placement of a Deformable Mirror or Spatial Light Modulator for this application, in which scattering and index mismatch are dominant aberrations, is in an optical plane that is conjugate to the pupil plane of the objective lens in the imaging system.

Adaptive optics for imaging through highly scattering media in oil reservoir applications

A deformable reflective surface is disclosed that may be used with a retroreflector to provide a modulated retroreflector. The modulated retroreflector may be used in communication systems such as optical laser communication systems wherein an incident beam is reflected back to the source, as modulated by the modulated retroreflector. The deformable reflective surface uniformly reflects or disperses an incident light, depending on a deformation state of the surface. The different states of the deformable reflective surface permits modulation of the reflected beam, based on an input modulation signal that can contain voice or sensor data, for example. A sensor may be used to sense the incident beam and activate the retroreflector. The deformable reflective surface may be arranged to be switched between a diffractive reflective surface and a uniform reflective surface.

MEMS based retroreflector

Method and apparatus for reducing the curvature of a micromachined structure having lamella (). Surface treatment by an ion beam () of the lamella () such as by sputtering removes regions of stress allowing the lamella () to return to a planar condition. The resulting outer surface is made suitable for use as a reflector and other purposes needing a substantially planar surface.

Ion beam modification of residual stress gradients in thin film polycrystalline silicon membranes

An array of micro valves, and the process for its formation, used for control of a fluid flow and having a substrate with a plurality of apertures for directing the fluid to flow from one side to another. A micromechanically formed fluid seal surrounds each aperture along with a valve diaphragm associated with each seal and micromechanically formed to selectively open and close the aperture by making contact with the seal. Electrical contact is made to the valve diaphragms and substrate for selective valve closure or opening. A conduit leads a fluid flow to the underside of the array and a further conduit leads it away from the array after passing through the selectively opened diaphragms.

Micro valve arrays for fluid flow control

Method and apparatus for forming an array of reflective elements for spatial light modulation. The array includes a substrate supporting electronically addressable actuators, each associated with a corresponding reflective element, a coupling attaching each actuator to the corresponding reflective element to place each reflective element in a substantially planar surface. Each electronically addressable actuator responds to predetermined addressing from a processing circuit to reposition the corresponding reflective element out of the planar surface a predetermined distance identified in the predetermined electronic addressing.

MEMS-based spatial-light modulator with integrated electronics

A process for manufacturing an optical data storage disk stamper includes the steps of providing an amorphous electroless nickel substrate including phosphorous in the amount in a range of about 5 to 15 percent by weight having a toughness of about 100 MPa.sqroot. m, a roughness in a range of about 1 to 50 nm, and a flatness of about 6 .mu.m and depositing a negative photoresist on a surface of the substrate. The substrate has a diameter greater than about 120 mm and a thickness greater than about 300 .mu.m. The negative photoresist then is exposed with a laser to form a negative, data pattern in the photoresist. The photoresist is developed, and the ceramic substrate is ion machined to form the data pattern, in the substrate, such that a spiral track of ridges and lands is formed wherein each ridge has a height of less than about 150 nm. After the data pattern has been ion machined into the substrate, the developed photoresist is stripped from the substrate.

Process for manufacturing optical data storage disk stamper

A process for manufacturing an optical data storage disk stamper includes the steps of providing a chemically vapor-deposited, silicon carbide substrate having a toughness of about 4.5 MPa.sqroot. m, a roughness of about 1 nm, and a flatness of about 6 .mu.m and depositing a negative photoresist on a surface of the substrate. The substrate has a diameter greater than about 120 mm and a thickness greater than about one mm. The negative photoresist then is exposed with a laser to form a negative, data pattern in the photoresist. The photoresist is developed, and the ceramic substrate is ion machined to form the data pattern, in the substrate, such that a spiral track of ridges and lands is formed wherein each ridge has a height of about in a range of 20 to 200 nm. After the data pattern has been ion machined into the substrate, the developed photoresist is stripped from the substrate.

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Mansfield, MA, United States of America

Thomas Gary Bifano