Carl-zeiss-smt Ag

Carl Zeiss Jena Gmbh

Carl Zeiss Ag

Carl Zeiss Sms Ltd.

Carl Zeiss Microelectric Systems Gmbh

Thomas Engel

Wolfgang Harnisch

Wilhelm Ulrich

Udo Dinger

Hans-Jürgen Mann

Marco Wedowski

Dieter Pauschinger

Herbert Gross

Axel Zibold

Wolfgang Reinecke

Juergen Heise

Roland Scheler

The invention is directed to a method for determining the image quality of an optical imaging system and to the use of the method according to the invention for determining the influence of samples on the amplitude distribution and phase front distribution of the illumination light, of which the amplitude distribution is known in particular. The invention comprises the following steps: adjusting the subassemblies relative to one another in such a way that it is possible to project images of a sample on the detection device; recording a plurality of images of the sample from different reference planes near the focus plane; improving the image quality by image processing, particularly to reduce noise, to compensate for local variations in sensitivity of the detection device, and to center the intensity centroids respectively on a predetermined location in the images; computational linking of the spatially resolved image information, of adjustment values and system variables relating to the optical imaging system, and of information concerning the sample with the aim of determining characteristic numbers that are characteristic of the wavefront deformation caused by the imaging system; and outputting the characteristic numbers and associating them with the imaging system for describing the image quality.

Method for determining the image quality of an optical imaging system

There is provided a reflective X-ray microscope for examining an object in an object plane. The reflective X-ray microscope includes (a) a first subsystem, having a first mirror and a second mirror, disposed in a beam path from the object plane to the image plane, and (b) a second subsystem, having a third mirror, situated downstream of the first subsystem in the beam path. The object is illuminated with radiation having a wavelength &#x3c;100 nm, and the reflective X-ray microscope projects the object with magnification into an image plane.

Reflective X-ray microscope and inspection system for examining objects with wavelengths &#x3c;100 nm

An apparatus for applying x-rays to an interior surface of a body cavity includes a catheter assembly, and one or more flexible probe assemblies. An x-ray generator assembly, including an optically activated x-ray source, is coupled to a distal end of each flexible probe assembly. The catheter assembly includes a body member defining one or more interior channels; an x-ray absorption control layer surrounding the body member; at least one inner tube enclosing the body member and the absorption control layer; at least one outer tube; and one or more inflatable elements coupled to the inner tube. The inflatable elements, when inflated, fixedly position the catheter assembly within the body cavity. Each flexible probe assembly is slidably positionable within at least one of the interior channels, and includes a transmission path adapted to transmit an activating energy, such as light from laser, onto a cathode within the x-ray source.

X-ray catheter assembly

A microscope, especially a microscope that is used for inspection in semiconductor manufacture is disclosed. The microscope comprises a pulsed laser for the purpose of illumination, preferably in the UV range. At least one rotating diffusion disk is disposed downstream of the laser so as to homogenize the illumination. Preferably, two rotating diffusion disks of opposite rotational sense are disposed in the illumination beam path either directly or indirectly one behind the other.

Microscope, especially microscope used for inspection in semiconductor manufacture

The invention is directed to a device for flat illumination of an object field in an optical instrument and to an optical instrument with a device of this kind. Optical instruments of this type are, for example, microscopes, including microlithography simulation microscopes in which a flat illumination, i.e., illumination extending beyond a singular object point, of the object to be examined is required. The device comprises a laser light source and a light-conducting cable with at least one optical fiber through which the light from the laser light source is guided to the object field. The optical fiber is constructed and dimensioned in such a way that the intensity of the illumination light within the cross section of the optical fiber becomes increasingly more uniform along the path from the input-side end to the output-side end, and the illumination light is directed from the output-side end of the optical fiber to the object with substantially homogeneous intensity distribution.

Device for flat illumination of an object field

Growing community of inventors

Niedernissa, Germany

Thomas Engel