Leica Microsystems Lithography Gmbh

Vistec Electron Beam Gmbh

Thomas Elster

Hans-Joachim Doering

Christoph Damm

Thomas Peschel

Stefan Risse

Dirk Beyer

Matthias Slodowski

Gerhard Schubert

Christoph Schenk

Joachim Heinitz

Andreas Gebhardt

Peter Hahmann

Mathias Rohde

Dorothee Krauhs

Hans-Joachim D&ouml;ring

Hans-Joachim Döring

The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in the semiconductor industry. It is the object of the invention to find a novel possibility for illuminating a substrate with a plurality of individually shaped, controllable particle beamlets which permits a high-resolution structuring of substrates with a high substrate throughput without limiting the flexibility of the applicable structure patterns or limiting the high substrate throughput due to a required flexibility.

Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns

An illumination condenser for a particle optics projection system is disclosed. The illumination condenser is formed of a magnetic lens comprising a plurality of gaps. The magnetic lens is formed of a sequence of a plurality of partial lenses.

Illumination condenser for a particle optical projection system

A correction lens system for a particle beam projection device with at least a first magnetic lens and a second magnetic lens is disclosed. A plurality of correction lens pairs is arranged between the first magnetic lens and second magnetic lens and the particle beam.

Correction lens system for a particle beam projection device

The invention is directed to electrostatic deflection systems for corpuscular beams which can be used particularly in microstructured and nanostructured applications in lithography installations or measuring equipment. According to the proposed object of the invention, the individual electrodes of a deflection system of this kind should permanently have and retain a very exact axially symmetric arrangement relative to one another. In the electrostatic deflection system according to the invention, rod-shaped electrodes are held in an axially symmetric arrangement in an inwardly hollow carrier through which a corpuscular beam can be directed. The carrier is formed of at least two, and at most four, carrier members which are connected to one another.

Electrostatic deflection system for corpuscular radiation

The invention concerns a method for exposing a substrate ( ) equipped with an n-layer photoresist system ( ), an electrically conductive connection being created between a ground potential and the substrate ( ) and/or at least one of the layers S through S of the photoresist system ( ). The invention furthermore concerns an arrangement for carrying out said method. According to the present invention, what is achieved in a single process step is that by way of spring elements E through E , a contact tip K is advanced as far as the layer S , a contact tip K is advanced through the layer S as far as the layer S , a contact tip K is advanced through the layer S and S as far as the layer S , and so forth. The electrical charges from the layer S are dissipated to the ground potential via the contact tip K , the charges from the layer S via the contact tip K , etc., and/or and from the substrate ( ) via a contact tip K .

Method and device for exposing a substrate to light

The invention refers to a device for electrostatic deflection of a particle beam out of a primary beam direction for the purpose of scanning a plane spanned by two coordinates X, Y, in which multiple electrodes configured as deflection wires are connected to an activation circuit and are acted upon, depending on the activation, by modifiable deflection voltages; the primary beam direction intersects the origin of coordinates X and Y, and the respective applied deflection voltage is an equivalent for the deflection of the particle beam out of the primary beam direction in the direction of coordinate X or coordinate Y. In such a device, the deflection wires are linked into deflection grids and are joined to one another and to the activation circuit in such a way that an equivalent deflection voltage is always applied to all deflection wires belonging to one and the same deflection grid.

Device for electrostatic deflection of a particle beam

Growing community of inventors

Jena, Germany

Thomas Elster