Unaxis Balzers Limited

Oc Oerlikon Balzers Ag

Optics Balzers Ag

Thomas Eisenhammer

Martin Dubs

Siegfried Krassnitzer

Walter Haag

Stanislav Kadlec

Pius Grunenfelder

Bernd Heinz

Wolfgang Nutt

Helfried Weinzerl

Jeff Ou-Yang

Gebhard Stittmatter

Klaus Zapf

An optical filter having a substrate including a primary bandpass filter at least predominantly on an interference basis and a secondary bandpass filter at least predominantly on an interference basis. Both bandpass filters are designed such that they transmit sufficiently over the entire required angle range in the desired spectral transmittance wavelength interval. The primary bandpass filter contains the small angle shift required by the overall system. It also has a spectral transmittance wavelength interval which is as small as possible according to the requirements of the respective application and restricted by narrow blocking bands. The secondary bandpass filter is designed such that its transmittance wavelength interval is limited by a short-wave edge and a long-wave edge and is adjusted to the primary bandpass filter in such a way that its edges shift over the required angle range only within the blocking bands of the primary bandpass filter.

ASi-H bandpass filter comprising a second material with high refractive index and a second bandpass filter as a blocker

A Method for manufacturing an optical disc substrate comprises a first substrate with at least one structured surface, on which an anti-adhesive layer, preferably carbon, is deposited and first layer on top of said anti-adhesive layer. On a second substrate with a structured surface also a layer is deposited. Both substrates are bonded together with the layers facing each other. The separation now easily can take place afterwards alongside the adhesive layer. This way the first layer from the first substrate is being transferred to the second substrate.

Method for the production of multilayer discs

A first substrate () is positioned on a support surface () in a vacuum chamber with an upward-facing first bonding surface () spin-coated with adhesive while a second substrate () is held with downward-facing second bonding surface () to a cover () by suction. While the vacuum chamber is being evacuated to a pressure of between 0.1 mbar and 2 mbar, a support pin () is extended through central openings () of the substrates () and then retracted with the second substrate () released from the cover () and carried by radially extended balls (). The support pin () is lowered to a position where the balls (), acting against the first bonding surface (), deform the first substrate (). The first bonding surface () being therefore slightly concave, the first and second bonding surfaces () only touch close to their circumferences. Retraction of the balls () causes a spreading of the contact area radially inwards to cover the first and second bonding surfaces () without entrapment of non-bonded areas. The substrates () are then lifted by the support pin () with again extended balls () and pressed against the cover () and the vacuum chamber is aired.

Method for the bonding of disk-shaped substrates and apparatus for carrying out the method

This invention relates to a system and a method for the heat treatment of substrates, incorporating an annular heat-treatment section with a rotary table designed to accept substrate holders, at least two of which substrate holders are positioned one behind the other in heat-treatment zones that extend in a radial spoke pattern around the center of the rotary table.

Heat-treatment system and method

A workpiece is manufactured using a magnetron source that has an optimized yield of sputtered-off material as well as service life of the target. Good distribution values of the layer on the workpiece are obtained that are stable over the entire target service life, and a concave sputter face in a configuration with small target-to-workpiece distance is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is stationary and an eccentrically disposed inner pole with a second outer pole part is rotatable about the central source axis.

Method for manufacturing a workpiece using a magnetron sputter source

To optimize the yield of sputtered-off material as well as the service life of the target on a magnetron source, in which simultaneously good attainable distribution values of the layer on the substrate, stable over the entire target service life, a concave sputter face in a configuration with small target-substrate distance d is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is disposed stationarily and an eccentrically disposed inner pole with a second outer pole part is developed rotatable about the central source axis

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Azmoos, Switzerland

Thomas Eisenhammer