Gould Inc.

Design & Manufacturing Corporation

Thomas C Tisone

Barry F Bolker

Helmut H Krueger

Ronald S Sobecks

Hooshmand Zaghi

Thomas S Latos

Richard N Tauber

An improved deformable flexure element (10) for use in strain gage tranducers and a process for making the element are disclosed. By appropriate selection of materials and gage geometries in accordance with the invention, the zero and span temperature coefficients of the transducer are reduced substantially to zero. Improved processes for producing such flexure elements are disclosed.

Deformable flexure element for strain gage transducer and method of

A thin film strain gage is deposited on a flexure beam under controlled deposition conditions such that the dielectric parts thereof are normally in a compressive state. During use, when the strain gage is flexed in a manner tending to place parts thereof in tension, the dielectric parts are instead maintained either in compression, which is their more resistant state against mechanical fracture, or only in slight tension. Specifically, the dielectric films are deposited by sputtering with the substrate negatively biased, with the deposition rate and substrate temperature maintained at predetermined levels for enhancing compressive deposition.

Thin film strain gage and process therefor

A system is provided for monitoring sputtering deposition parameters and through closed-loop control achieving rapid modification of the parameters to maintain or to obtain a film composition. In reactive sputtering, the sputtering chamber has individual gas pressure controllers for the various gases to be added to the chamber. A holder for a substrate on which the film is to be deposited includes a heater with adjustable control. A differentially pumped quadrupole mass analyzer interconnects with the chamber bottom to receive a sample of plasma ions, measures the ionized species existing in the plasma and generates signals related to the film composition. A controller responsive to the quadrupole analyzer actuation adjusts the pressure of the one or more reactive or non-reactive gases being provided to the chamber, and/or controls other deposition parameters, such as substrate temperature or other plasma features.

Method and apparatus for monitoring and controlling sputter deposition

A positive temperature coefficient heater for enhancing the response time of thermal actuators is disclosed. The PTC heater is formed of a generally low resistance material that has an anomaly temperature above which the resistance of the heater increases dramatically. The anomaly temperature is chosen to substantially match the phase change temperature of a thermally expansive medium useful to power the actuator. The heater is self-regulating and provides a maximum surface area for heating the medium rapidly with a minimum of thermal mass and energy use. Preferably, the heater is formed of doped BaTiO.sub.3 in the general shape of an elongated annular cylinder.

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Thousand Oaks, CA, United States of America

Thomas C Tisone