Carl Zeiss Smt Gmbh

Carl-zeiss-stiftung

Carl-zeiss-smt Ag

Thomas Bischoff

Gerhard-Wilhelm Ziegler

Markus Deguenther

Manfred Maul

Nils Haverkamp

Michael Gerhard

Frank Schlesener

Vladimir Davydenko

Axel Scholz

Michael Muehlbeyer

Hermann Bieg

Uy-Liem Nguyen

Thomas Stammler

Daniel Walldorf

Stephan Kellner

Mirco Kern

Igor Hurevich

Stefan Xalter

Jochen Wieland

Bernhard Gellrich

Yim-Bun Patrick Kwan

Michael Trunz

Marcus Will

Stefan Mueller

Joachim Feucht

Willi Heintel

Guenter Maul

Martin Humphries

Markus Degünther

Hagen Federau

Yim-Bum Patrick Kwan

Karlheinz Schuster

Martin Huber

Francois Henzelin

Gerhard Szekely

Bernd Wuesthoff

The invention relates to an optical imaging device, in particular an objectivefor microlithography in the field of EUVL for producing semiconductor components, having a beam path, a plurality of optical elementsand a diaphragm devicewith an adjustable diaphragm opening shape. The diaphragm device has a diaphragm storewith a plurality of different diaphragm openingswith fixed shapes in each case, which can be introduced into the beam path

Diaphragm changing device

A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.

Illumination system for microlithography

The disclosure provides an arrangement for an optical device including a component of the optical device and a support structure supporting the component. The support structure includes at least one locking device connected to the component and including a first fixation device and an associated second fixation device. The first fixation device and the second fixation device are adapted to be, in a movable state, movable with respect to each other along a first degree of freedom and a second degree of freedom into a final position. The first fixation device and the second fixation device are further adapted to be, in a locked state, fixed in the final position by at least one locking device contacting the first fixation device and the second fixation device. In the movable state, the first fixation device and the second fixation device are movable, up to the final position, in a manner free from a mutual pre-stress resulting from a restoring force exerted by at least a part of one of the first fixation device and the second fixation device.

Support for a component of an optical device

There is provided a facet mirror device comprising a facet element and a support unit, the support unit supporting the facet element. The support unit comprises a first support element and a second support element, the second support element being connected to the facet element to support the facet element. The first support element is connected to the second support element to support the second support element, the first support element being connected to the second support element via at least one flexure unit, the flexure unit comprising at least one flexure.

Facet mirror device

A microlithography illumination system includes a first raster arrangement including a first plurality of bundle-forming raster elements arranged in or adjacent a first plane of the illumination system. The first plurality of bundle-forming raster elements is configured to generate a raster arrangement of secondary light sources. The illumination system also includes a transmission optics configured to superimpose transmission of the illumination light of the secondary light sources into the object field. The transmission optics includes a second raster arrangement comprising a second plurality of bundle-forming raster elements. The illumination system further includes a displacement device configured to displace a displaceable segment of the first raster arrangement relative to the second raster arrangement. The displaceable segment includes exactly one of the raster elements, a group of several raster elements, a raster column, a raster area, or several groups of raster elements.

Support for a component of an optical device including a locking device

A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system.

An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (&#x394;, &#x394;, &#x394;) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.

An optical imaging device (PL), in particular an objective for semiconductor lithography, is provided with at least one system diaphragm. The system diaphragm comprises a multiplicity of mobile plates, which are rotatably mounted. The plates have a spherical curvature.

Optical imaging device having at least one system diaphragm

An optical element module comprising a plurality of module components is provided. The module components comprise an optical element, an optical element holder and a contact element. The optical element has a first coefficient of thermal expansion. The optical element holder holds the optical element via the first contact element and has a second coefficient of thermal expansion, the second coefficient of thermal expansion being different from the first coefficient of thermal expansion. At least one of the module components is adapted to provide at least a reduction of forces introduced into the optical element upon a thermally induced position change in the relative position between the optical element and the optical element holder, the position change resulting from a temperature situation variation in a temperature situation of the plurality of module components.

Optical element module

An iris diaphragm, in particular for an exposure lens in semiconductor lithography, is provided with a diaphragm base ( ) and a grooved ring ( ) which can be rotated relative to one another, having a multiplicity of leaves ( ) which in each case are mounted in the diaphragm base ( ) and in the grooved ring ( ) and are guided by curved tracks ( ), arranged in the grooved ring ( ), for the purpose of adjusting the diaphragm aperture. A drive device ( ) serves the purpose of twisting the diaphragm base ( ) and grooved ring ( ) relative to one another. The curved tracks are designed as circumferential tracks ( ) in the grooved ring ( ). The circumferential track ( ) is split up into alternating useful-region curves ( ) and return curves ( ). The diaphragm base ( ) or the grooved ring ( ) can be rotated in a preselected rotary drive direction by a drive device ( ), the leaves ( ) being guided in a circulating fashion in the circumferential track ( ).

Iris diaphragm

An optical imaging device, in particular a lens system, has a system diaphragm ( ). An aperture of the system diaphragm ( ) is adjustable in its opening diameter (D). The axial position of the aperture of the system diaphragm ( ) with respect to the optical axis ( ) of the system diaphragm ( ) is fixed in dependence on the opening diameter (D) of the system diaphragm ( ).

Optical imaging device, in particular lens system, with at least one system diaphragm

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Koenigsbronn, Germany

Thomas Bischoff