Asml Netherlands B.v.

Thijs Vervoort

Sjoerd Nicolaas Lambertus Donders

Patricius Aloysius Jacobus Tinnemans

Johannes Petrus Martinus Bernardus Vermeulen

Edwin Johan Buis

Jan Frederik Hoogkamp

Aschwin Lodewijk Hendricus Johannes Van Meer

Raimond Visser

Henricus Gerardus Tegenbosch

Patrick Johannes Cornelus Hendrik Smulders

Jan Van Elp

Franciscus Andreas Cornelis Johannes Spanjers

Johannes Charles Adrianus Van Den Berg

Henricus Johannes Adrianus Van De Sande

The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.

Lithographic support structure

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Eindhoven, Netherlands

Thijs Vervoort