Asml Netherlands B.v.

Thijs Harink

Johannes Henricus Wilhelmus Jacobs

Paulus Martinus Maria Liebregts

Wilhelmus Josephus Box

Bernardus Antonius Johannes Luttikhuis

Petrus Rutgerus Bartray

Marco Koert Stavenga

A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply system supplies a clean gas to at least one location at which the substrate is located. The clean gas supply system is moveably mounted. A device manufacturing method utilizing the lithographic apparatus can be used to manufacture at least one of a flat panel display and an integrated circuit device.

Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination

A lithographic projection apparatus is disclosed. The apparatus includes a substrate support for supporting at least one substrate, a radiation system for providing at least one beam of radiation, and a vacuum chamber. The vacuum chamber includes a patterning device and/or a projection system. The patterning device is arranged for patterning the beam of radiation according to a desired pattern, and the projection system is arranged for projecting the patterned beam of radiation onto a target portion of the substrate. The apparatus also includes at least one thermal shield for thermally conditioning at least part of the apparatus. The thermal shield includes particle transmission channels for transmitting particles through the shield, from a first side of the shield to a second side of the shield.

Lithographic projection apparatus and device manufacturing method

A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project the patterned radiation beam onto a target portion of a substrate. A first vacuum environment contains the projection system, a second vacuum environment contains the patterning device support, and a separator separates the first and second vacuum environments. The separator includes an aperture for passing the projection beam from the first vacuum environment towards the patterning device and/or vice-versa. The patterning device forms at least part of a seal for substantially sealing the aperture of the separator.

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Eindhoven, Netherlands

Thijs Harink