Pfeiffer Vacuum Gmbh

Alcatel

Adixen Vacuum Products

Alcatel Lucent

Thierry Neel

Roland Bernard

Philippe Maquin

Serge Brandolin

Pascal Moine

Morgan Gelhaye

A vacuum line and method for controlling a vacuum line in which an auxiliary pumping device and a diluent gas injection device are controlled according to a first operating mode in which the pressure prevailing in the discharge pipe is maintained at less than or equal to 20,000 Pa or according to a second operating mode in which the pressure prevailing in the discharge pipe is greater than 20,000 Pa, and the injection of a diluent gas into the stream of the pumped gases is controlled, downstream of an intake of the rough pumping device, such as into the discharge pipe and/or into the rough pumping device and/or into the auxiliary pumping device by the diluent gas injection device in the second operating mode. This reduces the potential for explosion in the vacuum line via injection of diluent gas to lower flammable gas concentration.

Vacuum line and method for controlling a vacuum line to reduce explosion potential via injection of diluent gas to lower flammable gas concentration

A dry roughing vacuum pump includes a valve () with a through-passage arranged in the discharge line (), the valve () with a through-passage being able to move between a closed position in which the valve () with a through-passage is in contact with a seat of a mouth () of the discharge line () and an open position in which the valve with a through-passage is moved away from the mouth () of the discharge line (), the vacuum pump including a motor gas injection device () that is configured to inject a motor gas into the inlet () of the Venturi-effect passage ().

Dry roughing vacuum pump

A pumping device and method are described. The pumping device comprises a dry rough vacuum pump equipped with a gas inlet connected to a vacuum chamber, a gas outlet leading to a conduit and an ejector. The pumping method comprises pumping gases contained in the vacuum chamber using the dry rough vacuum pump through the gas inlet, measuring electric power consumed by the dry rough vacuum pump and the pressure of the gases in the conduit, starting the ejector, when the pressure of the gases at the outlet and the electrical power consumed cross respective set point values as they rise and stopping the ejector when the electric power consumed and the pressure of the gases in the conduit at the outlet cross respective set point values as they fall.

Vacuum pumping system having an ejector and check valve

A pumping system comprising at least one pump unit () with a vacuum pump casing in which there are multiple pumping stages that includes at least one pumped gas treatment system is provided. The pumped gas treatment system compromises at least one plasma source located inside the vacuum pump casing of the pump unit, to generate a plasma that at least partially decomposes certain gases passing through the pump unit. This reduces the size of the pumped gas treatment system and improves its efficiency so that a gas pumping and treatment system can be created that is sufficiently small as to allow it to be placed in close proximity to the process chambers.

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Meythet, France

Thierry Neel