Asml Netherlands B.v.

Asml Holding N.v.

Thibault Simon Mathieu Laurent

Johan Gertrudis Cornelis Kunnen

Ruud Hendrikus Martinus Johannes Bloks

Johannes Henricus Wilhelmus Jacobs

Martijn Houben

Sander Catharina Reinier Derks

Bastiaan Andreas Wilhelmus Hubertus Knarren

Robbert Jan Voogd

Gerardus Adrianus Antonius Maria Kusters

Gregory Martin Mason Corcoran

Marinus Jan Remie

Raymond Wilhelmus Louis Lafarre

Koen Steffens

Gerben Pieterse

Hendrikus Johannes Marinus Van Abeelen

Armand Rosa Jozef Dassen

Jan Steven Christiaan Westerlaken

Nicolaas Ten Kate

Joost Jeroen Ottens

Frank Johannes Jacobus Van Boxtel

Rogier Hendrikus Magdalena Cortie

Niek Jacobus Johannes Roset

Siegfried Alexander Tromp

Jim Vincent Overkamp

Justin Johannes Hermanus Gerritzen

Giovanni Francisco Nino

Ronald Van Der Ham

Yuri Johannes Gabriël Van De Vijver

Ivo Adam Johannes Thomas

Takeshi Kaneko

Ramin Badie

Pieter Lein Joseph Gunter

Coen Cornelis Wilhelmus Verspaget

Theodorus Wilhelmus Polet

Wilhelmus Franciscus Johannes Simons

Marcio Alexandre Cano Miranda

Han Henricus Aldegonda Lempens

Hrishikesh Patel

Marco Adrianus Peter Van Den Heuvel

Patricius Jacobus Neefs

Van Vuong Vy

Giovanna De Simone

Peng Feng

Martinus Hendrikus Antonius Leenders

Samir A Nayfeh

Haico Victor Kok

Adrianus Hendrik Koevoets

Christopher Charles Ward

Marcus Martinus Petrus Adrianus Vermeulen

Johannes Hubertus Antonius Van De Rijdt

Gijs Kramer

Günes Nakiboglu

Coen Hubertus Matheus Baltis

Christianus Wilhelmus Johannes Berendsen

Mark Josef Schuster

Justin Matthew Verdirame

Allard Eelco Kooiker

Peter A Delmastro

Simon Karel Ravensbergen

Nicholas Peter Waterson

Johannes Antonius Maria Van De Wal

Putra Saputra

Wilhelmina Margareta Jozef Hurkens-Mertens

Yohann Bruno Yvon Teillet

Michael Johannes Hendrika Wilhelmina Renders

Vincentius Fransiscus Cloosterman

Ruud Hendricus Martinus Johannes Bloks

Sjoerd Nicolaas Lambertus Donders

Johannes Petrus Martinus Bernardus Vermeulen

Stoyan Nihtianov

Kofi Afolabi Anthony Makinwa

Johannes Paul Marie De La Rosette

Robbert-Jan Voogd

Maria Del Carmen Mercado Carmona

Maria Del Carmen Mercado

A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

Lithographic apparatus and method

A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

Method of unloading an object from a support table

A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

Lithographic apparatus and a device manufacturing method

A lithographic apparatuscomprisingincludesan object tablewhich carries an object. The lithographic apparatus may furthercomprise at least oneinclude asensoras part of a measurement systemto measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimatetheadeformation oftheanobject due toavaryingloadsloadduring operation of the lithographic apparatus, for exampleavaryingloadsloadinduced by a two-phase flow in a channel formedwithinofthe object table.Additionally, or alternatively, theThelithographic apparatuscomprisesmay includea predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used toprovide apatterna substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.

Lithographic apparatus and an object positioning system

An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

Extraction body for lithographic apparatus

A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method

A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20&#xb0; C. in at least one direction.

Temperature sensing probe, burl plate, lithographic apparatus and method

A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

Lithographic apparatus

Growing community of inventors

Eindhoven, Netherlands

Thibault Simon Mathieu Laurent