Asml Netherlands B.v.

Theodorus Wilhelmus Polet

Giovanni Luca Gattobigio

Han Henricus Aldegonda Lempens

Erik Henricus Egidius Catharina Eummelen

Cornelius Maria Rops

Johannes Cornelis Paulus Melman

Koen Steffens

Rogier Hendrikus Magdalena Cortie

Koen Cuypers

Ronald Van Der Ham

Wilhelmus Franciscus Johannes Simons

Gerben Pieterse

Jorge Alberto Vieyra Salas

Miao Yu

Harold Sebastiaan Buddenberg

Gheorghe Tanasa

Ruud Olieslagers

Patrick Johannes Wilhelmus Spruytenburg

Artunç Ulucan

Nicolaas Ten Kate

Johannes Henricus Wilhelmus Jacobs

Raymond Wilhelmus Louis Lafarre

Thibault Simon Mathieu Laurent

Martijn Houben

Ruud Hendrikus Martinus Johannes Bloks

Siegfried Alexander Tromp

Jim Vincent Overkamp

Mark Johannes Hermanus Frencken

Evert Van Vliet

John Maria Bombeeck

Pepijn Van Den Eijnden

Floor Lodewijk Keukens

Marcel Maria Cornelius Franciscus Teunissen

Van Vuong Vy

Frank Debougnoux

Jantien Laura Van Erve

Raphael Nico Johan Stegen

Johannes Jacobus Matheus Baselmans

Henrikus Herman Marie Cox

Theodorus Marinus Modderman

Frank Johannes Jacobus Van Boxtel

Yuri Johannes Gabriël Van De Vijver

Jimmy Matheus Wilhelmus Van De Winkel

Günes Nakiboglu

Coen Hubertus Matheus Baltis

Gregory Martin Mason Corcoran

Daan Daniel Johannes Antonius Van Sommeren

Aleksandar Nikolov Zdravkov

Bart Smeets

Willem Jan Bouman

Walter Theodorus Matheus Stals

Josephus Peter Van Lieshout

Ferdy Migchelbrink

Christianus Wilhelmus Johannes Berendsen

Johan Franciscus Maria Beckers

Nirupam Banerjee

Francis Fahrni

Ronald Frank Kox

Petrus Martinus Gerardus Johannes Arts

Rik Vangheluwe

Maarten Holtrust

Mike Paulus Johannes Van Gils

Wouterus Jozephus Johannes Van Sluisveld

Johannes Cornelius Paulus Melman

Thibault Laurent

Johannes Jacobs

Ruud Bloks

Han Lempens

Wilhelmus Simons

Raymond Lafarre

Rogier Cortie

An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

Lithography apparatus and a method of manufacturing a device

A fluid handling system for wetting a substrate irradiated by radiation. The fluid handling system include a first device to confine a first liquid to a first space between the first device and the substrate. The first device includes a first liquid supply member to provide the first liquid to the first space and an extraction member to remove liquid. The fluid handling system further includes a second device including a second liquid supply member to provide a second liquid to a second space between the second device and the substrate, wherein there is a gap on the surface of the substrate between the first and second liquids. The fluid handling system is configured to provide the second liquid to the second space without removing any liquid from the second space to form a liquid layer, and is configured to provide the first and second liquids on the substrate simultaneously.

Fluid handling system and lithographic apparatus

A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

Fluid handling structure for lithographic apparatus

A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure comprising an aperture formed therein for the passage therethrough of a radiation beam through the immersion fluid, the aperture defining an immersion space to be filled with the immersion fluid, and an inner part and an outer part; wherein the inner part and the outer part are arranged so as to form therebetween a variable space and a connecting space that connects the variable space to the immersion space, wherein the outer part is movable relative to the inner part in a first plane so as to change in shape the variable space but not the connecting space, and wherein the fluid handling structure is configured to contain the immersion fluid in the variable space.

Fluid handling structure, a lithographic apparatus, a method of using a fluid handling structure and a method of using a lithographic apparatus

Lithography apparatus and device manufacturing method

A process tool for processing production substrates, the process tool including: a movable stage configured to perform long-stroke movements in an X-Y plane; an imaging device mounted to a fixed part of the tool and having an optical axis substantially parallel to the X-Y plane; and a mirror mounted on the movable stage and oriented at a predetermined angle of inclination to the X-Y plane so that by moving the movable stage to a predetermined position a part of a component to be inspected can be imaged by the imaging device.

Process tool and an inspection method

An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

Fluid handling structure and lithographic apparatus

A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure having an aperture formed therein for the passage therethrough of a radiation beam through the immersion fluid, the aperture defining an immersion space to be filled with the immersion fluid, and having an inner part and an outer part, wherein the inner part and the outer part are arranged so as to form therebetween a variable space and a connecting space that connects the variable space to the immersion space, wherein the outer part is movable relative to the inner part in a first plane so as to change in shape the variable space but not the connecting space, and wherein the fluid handling structure is configured to contain the immersion fluid in the variable space.

Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure

A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.

Method of performance testing working parameters of a fluid handling structure and a method of detecting loss of immersion liquid from a fluid handing structure in an immersion lithographic apparatus

A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.

Cleaning device and method of cleaning

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Geldrop, Netherlands

Theodorus Wilhelmus Polet