Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Carl Zeiss Smt Gmbh

Theodorus Petrus Maria Cadee

Joost Jeroen Ottens

Patricius Aloysius Jacobus Tinnemans

Martin Frans Pierre Smeets

Erik Roelof Loopstra

Jeroen Johannes Sophia Maria Mertens

Nicolaas Ten Kate

Marco Koert Stavenga

Boris Menchtchikov

Frederik Eduard De Jong

Stoyan Nihtianov

Koen Goorman

Marcel Johannus Elisabeth Hubertus Muitjens

Bart Leonard Peter Schoondermark

Johannes Henricus Wilhelmus Jacobs

Michel Riepen

Johannes Petrus Martinus Bernardus Vermeulen

Koen Jacobus Johannes Maria Zaal

Franciscus Johannes Joseph Janssen

Martinus Cornelis Maria Verhagen

Jacobus Johannus Leonardus Hendricus Verspay

Johannes Anna Quaedackers

Antonius Johannus Van Der Net

Herman Boom

Christianus Gerardus Maria De Mol

Richard Moerman

Sjoerd Nicolaas Lambertus Donders

Ruud Antonius Catharina Maria Beerens

Maria Elisabeth Reuhman-Huisken

Sven Antoin Johan Hol

Antonius Franciscus Johannes De Groot

Yang-Shan Huang

Aschwin Lodewijk Hendricus Johannes Van Meer

Hans Butler

Harmeet Singh

Engelbertus Antonius Fransiscus Van Der Pasch

Raymond Wilhelmus Louis Lafarre

Jan Van Eijk

Adrianus Hendrik Koevoets

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Noud Jan Gilissen

Richard Henricus Adrianus Van Lieshout

Aschwin Lodewijk Hendricus Johannes Vermeer

Vadim Yevgenyevich Banine

Arno Jan Bleeker

Marc Wilhelmus Maria Van Der Wijst

Johannes Antonius Gerardus Akkermans

Sander Christiaan Broers

Martinus Hendricus Henricus Hoeks

Arie Jeffrey Den Boef

Johannes Catharinus Hubertus Mulkens

Martinus Hendrikus Antonius Leenders

Maarten Marinus Johannes Wilhelmus Van Herpen

Nicolaas Rudolf Kemper

Henrikus Herman Marie Cox

Andre Bernardus Jeunink

Derk Jan Wilfred Klunder

Frits Van Der Meulen

Jan Bernard Plechelmus Van Schoot

Harmen Klaas Van Der Schoot

Theodorus Marinus Modderman

Wouter Anthon Soer

Vladimir Vitalevitch Ivanov

Wilhelmus Franciscus Johannes Simons

Stig Bieling

Konstantin Nikolaevitch Koshelev

Robert-Han Munnig Schmidt

Vladimir Mihailovitch Krivtsun

Olav Waldemar Vladimir Frijns

Bernardus Antonius Slaghekke

Antonius Theodorus Wilhelmus Kempen

Rene Theodorus Petrus Compen

Marcel Koenraad Marie Baggen

Jan Jaap Kuit

Arnoud Cornelis Wassink

Marcel Hendrikus Maria Beems

Martinus Agnes Willem Cuijpers

Robbert Edgar Van Leeuwen

Wilhelmus Henricus Theodorus Maria Aangenent

Alexander Matthijs Struycken

Gerardus Adrianus Antonius Maria Kusters

Ramin Badie

Pieter Renaat Maria Hennus

Fransiscus Mathijs Jacobs

Edwin Augustinus Matheus Van Gompel

Christiaan Louis Valentin

Robertus Mathijs Gerardus Rijs

Ronald Walther Jeanne Severijns

Niels Johannes Maria Bosch

Olof Martinus Josephus Fischer

Martijn Van Baren

Rob Jansen

Paul Peter Anna Antonius Brom

Ivo Vanderhallen

Jacob Willem Vink

Hendrikus Johannes Schellens

Jeroen Johannes Theodorus Hendrikus De Best

Adrianus Marinus Wouter Heeren

Bo Lenssen

Jeroen De Boeij

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Lithographic apparatus and device manufacturing method involving a heater

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.

A method of thermally conditioning a physical object, includes guiding a two-phase cooling medium through a cooling duct of the physical object, wherein the guiding includes: guiding the two-phase cooling medium in a liquid phase via a pre-heating duct of the physical object from a supply side of the physical object at least partly towards a discharging side of the physical object, the two-phase cooling medium being pre-heated in the pre-heating duct; guiding the two-phase cooling medium from the pre-heating duct to a phase transitioning duct of the physical object, the two-phase cooling medium at least partly transitioning from the liquid phase towards a gas phase in the phase transitioning duct; guiding the two-phase cooling medium from the phase transitioning duct to a discharging duct of the physical object; and discharging at the discharging side the two-phase cooling medium from the discharging duct.

Thermal conditioning method

A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.

Sensor, object positioning system, lithographic apparatus and device manufacturing method

A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.

Radiation collector, radiation source and lithographic apparatus

A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.

Lithographic apparatus comprising an actuator, and method for protecting such actuator

A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.

Lithographic apparatus and device manufacturing method

A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.

Stage system and a lithographic apparatus

A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body.

Lithographic apparatus

A lithographic apparatus comprises a substrate table for accommodating a substrate; a projection system for imaging a pattern onto the substrate, and a metrology system for measuring a position of the substrate table with respect to the projection system. The metrology system comprises a metrology frame connected to the projection system, a grid positioned stationary with respect to the metrology frame, and an encoder connected to the substrate table and facing the grid for measuring the position of the substrate table relative to the grid. The metrology frame has a surface oriented towards the substrate table, and the surface has been configured, e.g., by writing or etching, so as to form the grid.

Lithographic apparatus with a metrology system for measuring a position of a substrate table

A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.

A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.

Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method

An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.

Support, lithographic apparatus and device manufacturing method

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Vlierden, Netherlands

Theodorus Petrus Maria Cadee