Asm IP Holding B.v.

Theodorus Oosterlaken

Chris De Ridder

Lucian C Jdira

Dieter Pierreux

Bert Jongbloed

Werner Knaepen

Steven Van Aerde

Kelly Houben

Cornelis Thaddeus Herbschleb

The disclosure relates to substrate processing apparatus, with a first and second reactor, each reactor configured for processing a plurality of substrates; and, a substrate handling robot constructed and arranged to transfer substrates between a substrate cassette at a substrate transfer position and the first and second reactor. The apparatus is constructed and arranged with a maintenance area between the first and second reactors to allow maintenance of the reactors from the maintenance area to both the first and second reactor.

Substrate processing apparatus for processing substrates

A substrate processing apparatus, comprising a substrate support () provided with a support surface () for supporting a substrate or a substrate carrier () thereon and a support heater () constructed and arranged to heat the support surface (). The apparatus comprises a heat shield constructed and arranged to cover and shield the substrate support () when no substrate or substrate carrier () is on the support surface.

Substrate processing apparatus and method

The invention relates to a substrate processing apparatus comprising a reaction chamber provided with a substrate rack for holding a plurality of substrates in the reaction chamber. The substrate rack may have a plurality of spaced apart substrate holding provisions configured to hold the plurality of substrates. The apparatus may have an illumination system constructed and arranged to irradiate radiation with a range from 100 to 500 nanometers onto a top surface of the substrates.

A substrate processing apparatus, provided with a substrate carrier support to support a substrate carrier thereon. The carrier support comprises a top support surface to support the substrate carrier; a thermally insulating body of thermally insulating material; and, a primary heater to heat the carrier support. The thermally insulating body is provided at least between the support surface and the primary heater.

The invention relates to an apparatus for manufacturing a semiconductor device comprising a reaction chamber comprising a substrate holder for holding a substrate; and, a heater for heating the substrate. The heater may comprise a vertical cavity surface emitting laser constructed and arranged to emit a radiation beam to a substrate held by the substrate holder to heat the substrate.

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Oudewater, Netherlands

Theodorus Oosterlaken