Asml Netherlands B.v.

Asml Holding N.v.

Theodorus Marinus Modderman

Joannes Theodoor De Smit

Erik Roelof Loopstra

Joeri Lof

Klaus Simon

Roelof Aeilko Siebrand Ritsema

Johannes Catharinus Hubertus Mulkens

Christiaan Alexander Hoogendam

Bob Streefkerk

Helmar Van Santen

Aleksey Yurievich Kolesnychenko

Alexander Straaijer

Antonius Theodorus Anna Maria Derksen

Gerrit Johannes Nijmeijer

Vadim Yevgenyevich Banine

Marcel Mathijs Theodore Marie Dierichs

Hendricus Johannes Maria Meijer

Theodorus Hubertus Josephus Bisschops

Sjoerd Nicolaas Lambertus Donders

Frederik T E Heuts

Richard J H Du Croo De Jongh

Marcus E J Boonman

Jacob F F Klinkhamer

Johannes Jacobus Matheus Baselmans

Cornelius Maria Rops

Ronald Van Der Ham

Koen Steffens

Theodorus Wilhelmus Polet

Johannes Christiaan Maria Jasper

Bart Smeets

Thomas J M Castenmiller

Willem Jan Bouman

Johannes C M Jasper

Nicolaas A A J Van Asten

Jacobus Gemen

Marcus Adrianus Van De Kerkhof

Theodorus Petrus Maria Cadee

Joseph Harry Lyons

Derk Servatius Gertruda Brouns

Han Henricus Aldegonda Lempens

Gerben Pieterse

Aage Bendiksen

Manish Ranjan

Joshua Adams

Johan Maria Van Boxmeer

Jacob Willem Vink

Nicolaas Antonius Allegondus Johannes Van Asten

Richard Jacobs

Andrew Judge

Nicholaas A A J Van Asten

Veera Venkata Narasimha Narendra Phani Kottapalli

Xugang Xiong

Antonius Derksen

Roelof Ritsema

Johannes Mulkens

An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.

Apparatus and method for determining a condition associated with a pellicle

In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

Lithographic apparatus and device manufacturing method

An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

Lithographic apparatus and a method of manufacturing a lithographic apparatus

A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.

Lithographic apparatus

An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.

Immersion lithographic apparatus and device manufacturing method

A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

In a single or multiple stage lithography apparatus, a table provides a confining surface to a liquid supply system during, for example, substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of the projection beam during, for example, substrate table exchange and/or substrate loading and unloading.

Lithographic apparatus and method involving a fluid inlet and a fluid outlet

In a lithographic apparatus, a liquid supply system to provide a liquid to a space between the table and an optical element and to contact a surface of the optical element, the space having a cross-sectional area smaller than the area of the substrate, the liquid supply system comprising a liquid confinement structure extending along at least a part of a boundary of the space between the optical element surface and the table, wherein at least part of the liquid confinement structure is positioned between the optical element surface and the table, the at least part of the liquid confinement structure has an aperture through which the patterned beam can pass, the liquid confinement structure comprises an inlet to supply the liquid to the space above the aperture, and the liquid confinement structure comprises an outlet to remove the liquid, supplied by the inlet, from the space below the aperture.

Lithographic apparatus and device manufacturing method with a liquid inlet above an aperture of a liquid confinement structure

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Nuenen, Netherlands

Theodorus Marinus Modderman