Massachusetts Institute of Technology

Motorola Corporation

Other

Theodore M Bloomstein

John W Maher

Roderick Russell Kunz

Stephen T Palmacci

James H Errico

James A Henderson, Jr

Douglas P Hart

Daniel J Ehrlich

Mordechai Rothschild

Jason Z Fischman

Eric Morgan

Peter Godart

Anita M Flynn

EthelMae Victoria Dydek

James M Connor

Jean Sack

Michael Switkes

Andrew Whitehead

James Erricco

Flow through reactors and related methods for use with slurries including water reactive particles are generally described.

Flow through fuel reactor

An underwater liquid supply unit includes a first bladder containing a first liquid, a second bladder containing a second liquid, and a third bladder containing a third liquid. The combined volume of the first liquid, second liquid, and third liquid is neutrally buoyant relative to a surrounding medium the liquid supply unit is disposed in (e.g., in seawater). As the first liquid, second liquid, and third liquid are dispensed from the bladders, the bladders may reduce in size in at least one dimension. As the liquids are dispensed, the liquids may be dispensed in a predetermined volumetric ratio based on the density of the liquids to maintain neutral buoyancy of the combined volume of liquid. The underwater liquid supply unit may also include an integrated generator such as a fuel cell, as well as a propeller.

Neutrally buoyant liquid supply units for underwater vehicles

Methods for the preparation of multilayered resists are described. To efficiently pattern large contiguous areas rapidly, a procedure has been developed using spot-size modulation of the focused laser beam to more efficiently pattern interior portions. Critical portions at the perimeter are patterned at high resolutions. The spot-size is progressively increased towards the interior allowing a controlled transition to coarser spot-sizes without impacting the exposure dose in critical portions. Patterning times are significantly reduced since in effect shells are patterned. An algorithm is defined to subdivide a layer into different zones, determine the appropriate focused spot-sizes used for each zone, and define the laser scan trace within a zone to enable efficient patterning of broad areas in positive tone resists.

Stereolithographic patterning with variable size exposure areas

Methods for the preparation of multilayered resists are described. A first layer of photoresist is deposited onto a substrate. First portions of the first layer are exposed to a first dose of radiant energy. A second layer of photoresist is deposited at atop the first layer and second portions of the second layer are exposed to a second varied dose of radiant energy. The dose is modulated over different portions of a layer to preferentially enhance development within the interior of the structure to reduce total development times.

Stereolithographic patterning by variable dose light delivery

Methods for the preparation of multilayered resists include exposure of the a first layer to radiation followed by exposure to an oxidizing agent. The oxidizing agent alters the surface characteristics of the first resist layer such that it is rendered more hydrophilic than the original resist layer. A second layer of resist is then applied to the oxidized surface of the first resist layer and exposed to radiation. This process can be repeated for thousands of coating layers, thereby permitting stereolithographic patterning of parts and construction of micromachines. A final treatment with a dissolution solution will dissolve unwanted resist material. Dependent upon the type of resist material used in the multilayered resist, the dissolution solution can remove the radiation exposed areas, e.g., a positive resist, or remove unexposed areas, e.g., a negative resist.

Stereolithographic patterning with interlayer surface modifications

An interference projection system for use with lithography using quasi-coherent sources, which has a non-diffractive beam splitting module and a non-diffractive module to cause interference of two or more beams, the modules combining to form interfering beams having the same orientation on a target surface. Two etalons are used to split a beam, to form two beams of the same orientation, strength and polarization. One or more pairs of mirrors cause the beam to interfere.

Interferometric projection system

A method for producing a three-dimensional object includes the steps of providing an interface plane within a chamber and generating a beam of radiant energy having varied levels of beam energy density. The beam is directed to selectively expose a pattern of address points on the interface plane to the beam of radiant energy for a limited duration. Conditions are established in the chamber to enable the beam to induce a micro-chemical reaction at the interface plane at a rate which serves to form a portion of the three-dimensional object. A significant feature of the invention is that the micro-chemical reaction is substantially binary with respect to the beam energy density. That is, the reaction is either substantially 'on' or substantially 'off.'

Methods for fabricating three-dimensional micro structures

An operator MUX interface (OMI) (102) includes a data base manager (203) that manages at least two data bases. The first comprises a substantially non-temporary data base, and the second comprises a substantially temporary data base. The latter includes information from both the first data base, and other information as well. The data base manager (203) automatically alters the data storage structure of the second data base whenever either the data storage structure for the first data base is changed, or whenever new information must be added to the second data base, and the data storage structure of the second data base will not readily accommodate that addition.

Database management system having first and second databases for

The present invention discloses a communication system network that comprises a plurality of communication systems and a processing multiplexer. The communication systems, which may be either conventional communication systems and/or trunked communication systems, transmit digitized audio signals and communication system data to the processing multiplexer. Based on signal destination data, which is part of the communication system data, the processing multiplexer processes the digitized signals and routes the resultant signals to the appropriate signal destinations.

Method and apparatus for processing digital signals

The present invention discloses a communication system network that comprises a plurality of communication systems and a processing multiplexer. The communication systems, which may be either conventional communication systems and/or trunked communication systems, transmit digitized audio signals and communication system data to the processing multiplexer. Based on signal destination data, which is part of the communication system data, the processing multiplexer processes the digitized signals and routes the resultant signals to the appropriate signal destinations of the communication systems.

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Brookline, MA, United States of America

Theodore M Bloomstein