Other

The United States of America as Represented by the Administrator of the

Samco International, Inc.

The United States of America as Represented by the Administrator of

Theodore J Wydeven

James C Fletcher

Robert A Frosch

Alan M Lovelace

Daniel L Flamm

Peter Wood

Martin Hudis

LeRoy A Spitze

Narcinda R Lerner

John R Hollahan

Catherine C Johnson

Edward V Ballou

Moshe G Katz

An ultraviolet ozone oxidation system combines ultraviolet radiation, ozone, and heat to gently and effectively remove organic materials from a variety of substrates. The UV-ozone oxidation system includes a source of ozone which flows into a reaction chamber of the ultraviolet ozone oxidation system. The reaction chamber includes a UV lamp positioned above a heated sample stage. The heated sample stage is movably mounted such that a distance between the work piece or sample and the UV lamp can be adjusted to a minimum possible distance to improve process time. In addition, the heated sample stage is provided with a radiant heater which will provide adequate heating of the sample stage while the distance between the heater and the sample stage may be varied. The reaction chamber is also provided with a membrane diffuser which is positioned between the ozone source and the sample stage for uniformly distributing ozone to the sample on the sample stage.

Ultraviolet-ozone oxidation system and method

A calorimetric test device for monitoring the effectiveness of an ozone-ultraviolet light apparatus for cleaning-stripping work pieces is disclosed. This device relies upon the ability of ozone to bring about a color change, typically a bleaching of the color, in various organic dyes. A kit fore carrying out the test of an ozone-ultraviolet cleaning-stripping apparatus is also disclosed. This kit includes the test device just described in a premoistened form enclosed in an openable moisture-impermeable container. Test methods using the test device and kit are disclosed.

Test device for ozone-ultraviolet cleaning-stripping equipment

A method for etching or removing polymers, photoresists, and organic contaminants from a substrate is disclosed. The method includes creating a more reactive gas species by producing a plasma discharge in a reactive gas such as oxygen and contacting the resulting gas species with a sacrificial solid organic material (13A) such as polyethylene or poly(vinyl fluoride), producing a highly reactive gas species, which in turn etches the starting polymer, organic contaminant, or photoresist (13). The sample to be etched is located away from the plasma glow discharge region (11) so as to avoid damaging the substrate by exposure to high-energy particles and electric fields encountered in that region. Greatly increased etching rates are obtained. This method is highly effective for etching polymers such as polyimides and photoresists that are otherwise difficult or slow to etch downstream from an electric discharge in a reactive gas.

Etching method for photoresists or polymers

A method for preparing water-insoluble asymmetric reverse osmosis membranes from water-soluble polymers is disclosed. The method involves casting a polymer film, partially drying it and then contacting it with a transition metal polyvalent ion solution. Optionally, the product of the contacting is cross-linked such as by radiation or heat. The membrane products are disclosed as well.

Method for the preparation of thin-skinned asymmetric reverse osmosis

Static charges and agglomeration of particles in a fluidized bed system are minimized by maintaining in at least part of the bed a radio frequency glow discharge. This approach is eminently suitable for processes in which the conventional charge removing agents, i.e., moisture or conductive particle coatings, cannot be used. The technique is applied here to the disproportionation of calcium peroxide diperoxyhydrate to yield calcium superoxide, an exceptionally water and heat sensitive reaction.

Use of glow discharge in fluidized beds

Polymeric membranes suitable for use in reverse osmosis water purification because of their high urea and salt rejection properties are prepared by generating a plasma of an unsaturated hydrocarbon monomer and nitrogen gas from an electrical source and forming a polymeric membrane by depositing a polymer of said unsaturated monomer from said plasma onto a substrate, such that nitrogen from the nitrogen gas is incorporated within the polymer in a chemically combined form.

Reverse osmosis membrane of high urea rejection properties

The abrasion resistance of plastic surfaces coated with polymerized organosilanes can be significantly improved by post-treatment of the polymerized silane in an oxygen plasma. For optical purposes, the advantages of this post-treatment are developed with a transparent polycarbonate resin substrate coated with plasma polymerized vinyltrimethoxysilane.

Oxygen post-treatment of plastic surfaces coated with plasma polymerized

A plasma polymerization process for the deposition of a dielectric polymer coating on a substrate comprising disposing the substrate in a closed reactor between two temperature-controlled electrodes connected to a power supply, maintaining a vacuum within the closed reactor, causing a monomer gas or a gas mixture of a monomer and diluent to flow into the reactor, generating a plasma between the electrodes, and varying and controlling the dielectric constant of the polymer coating being deposited by regulating the gas total and partial pressures, the electric field strength and frequency, and the current density. A monomer, such as a polar saturated or unsaturated nitrogen-containing compound, or a monomer and diluent, such as a saturated or unsaturated aliphatic hydrocarbon and nitrogen, can be polymerized to form a dielectric coating having a varying dielectric constant in accordance with this plasma polymerization process.

Preparation of dielectric coatings of variable dielectric constant by

A radio-frequency glow discharge reactor for removing trace oxidizable contaminants from an oxygen bearing atmosphere including a reaction chamber defined by an inner metal electrode facing a dielectric backed by an outer conductive electrode. In one embodiment, a conductive liquid forms the conductor of an outer electrode and cools the dielectric. A resonator coupled to a variable radio-frequency source generates the high voltages for creating a glow discharge in the chamber at a predetermined pressure whereby the trace contaminants are oxidized into a few simple non-toxic products that may be easily recovered. The corresponding process for removal of trace contaminants from an oxygen-bearing atmosphere with high efficiency independent of the concentration level is also disclosed.

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Sunnyvale, CA, United States of America

Theodore J Wydeven