General Electric Company

Abb Schweiz Ag

Thangavelu Asokan

Adnan Kutubuddin Bohori

George William Roscoe

Govardhan Ganireddy

Robert Joseph Caggiano

John James Dougherty

Dean A Robarge

Cecil Rivers, Jr

Sunil Srinivasa Murthy

Thomas Frederick Papallo, Jr

David M Polizzotti

Mark Alan Frontera

Marcelo Esteban Valdes

Clarence Lavere Gordon, Iii

Manoj Kumar Koyithitta Meethal

Munishwar Ahuja

Gopi Chandran Ramachandran

Gopichand Bopparaju

Kunal Ravindra Goray

Ramasamy Anbarasu

Manoharan Venugopal

Debasish Mishra

Yatin Tayalia

Mandyam Rangayan Sridhar

Nagaveni Karkada

Shalini Thimmegowda

Seth Adam Cutler

Srinivas Naga Palvadi

Anandraj Sengupta

Hombe Gowda

Ranjit Manohar Deshmukh

Rammohan Rao Kalluri

Deepak Rajaram Raorane

Kamal Pandey

Ranganath Gururaj

Nalini Nanrudaiyan

Maheshwara Murthy

Thomas Frederich Papallo, Jr

Adnan Kuttubudin Bohori

Satyanarayana Murphy Ungarala

Pramod Kumar Pandey

Nimish Kumar

Yuseph Montasser

Setu Chokshi

Sujatha Pushpakanth

Dean Arthur Robarge

Jr Thomas Frederick Papallo

Adnan Kutubuddin John F 302 Marss Manor Bohori

Cecil Rivers Jr

Ravinuthala Ramakrishna Rao

Satyanarayana Murthy Ungarala

An apparatus is provided. The apparatus includes a plasma generation element physically coupled to a first main electrode. The plasma generation element includes at least a first open end and a second open end. Each open end defines a nozzle such that the first open end directs an ablative plasma to a second main electrode and the second open end directs the ablative plasma to a third main electrode.

System and apparatus for arc elimination

In one aspect, an apparatus, such as an electrical system, is provided. The electrical system can include a pair of conductors across which an arc is sporadically supported, the arc including load current from a load circuit. The electrical system can also include an energy source that is separate from the load circuit and configured to selectively charge an electrode assembly. The conductors and electrode assembly can be configured such that the arc, when present, will be lengthened or constricted due to the charge on the electrode assembly.

Apparatus for interrupting current

A circuit protection device includes a plasma gun configured to emit an ablative plasma along an axis, and a plurality of electrodes, wherein each electrode is electrically coupled to a respective conductor of a circuit and is arranged substantially along a plane that is substantially perpendicular to the axis such that each electrode is positioned substantially equidistant from the axis.

Electrode and plasma gun configuration for use with a circuit protection device

A system comprising a circuit interrupter configured to interrupt flow of current through a circuit during an over current condition, wherein the circuit interrupter comprises two contacts configured to remain in contact when a current flowing through the two contacts is less than a threshold value, a tripping mechanism configured to separate the two contacts when the current equals or exceeds the threshold value, and at least one of either a permanent magnet or an electrode configured to extinguish an electric arc formed between the two contacts of the circuit interrupter when the two contacts are separated, wherein the circuit interrupter does not include an arc chute.

Arc chuteless DC current interruptor

An electrical fault mitigation system includes a mitigation device including a containment chamber defining a cavity, a first electrode positioned within the cavity and coupled to a first conductor, and a second electrode positioned within the cavity and coupled to a second conductor. The mitigation device also includes a first voltage source, and a plasma gun positioned within the cavity and configured to emit ablative plasma using the first voltage source to discharge energy from an electrical fault. The system also includes a first voltage limiter device configured to limit a voltage of the first conductor from increasing above a predetermined threshold to prevent a second voltage source from generating a second electrical arc between the first electrode and the second electrode when the second voltage source applies a voltage across the first electrode and the second electrode.

Method and systems for discharging energy from an electrical fault

A plasma gun with two gap electrodes on opposite ends of a chamber of ablative material such as an ablative polymer. The gun ejects an ablative plasma at supersonic speed. A divergent nozzle spreads the plasma jet to fill a gap between electrodes of a main arc device, such as an arc crowbar or a high voltage power switch. The plasma triggers the main arc device by lowering the impedance of the main arc gap via the ablative plasma to provide a conductive path between the main electrodes. This provides faster triggering and requires less trigger energy than previous arc triggers. It also provides a more conductive initial main arc than previously possible. The initial properties of the main arc are controllable by the plasma properties, which are in turn controllable by design parameters of the ablative plasma gun.

Ablative plasma gun

An ablative plasma gun is presented. The ablative plasma gun includes a first gun electrode and a second gun electrode arranged between a dielectric layer to form a longitudinal slot. An opening at a distal end of the longitudinal slot is provided to spread generated plasma.

An arc containment device is presented. The arc containment device includes a shock shield further having a multiple apertures for escape of gas, the shock shield configured to surround an arc source. The device further comprises an inner enclosure having a multiple openings generally aligned with the multiple apertures, the inner enclosure configured to provide an electrical insulation base for the arc source. An outer enclosure disposed is provided around the inner enclosure, the outer enclosure configured to direct the gas to the environment outside the device.

Arc containment device and method

Provided is an apparatus, such as an arc mitigating device, which can include a first plasma generation device and a second plasma generation device. The second plasma generation device can include a pair of opposing and spaced apart electrodes and a low voltage, high current energy source connected therebetween. A conduit can be configured to direct plasma between the first and second plasma generation devices, such that the second plasma generation device receives plasma generated by the first plasma generation. The plasma from the first plasma generation device can act to reduce the impedance of an area between the pair of opposing electrodes sufficiently to allow an arc to be established therebetween due to the low voltage, high current energy source.

Plasma generation apparatus

A method is provided that includes providing a resin in liquid form. The resin can be partially cured, and subsequent to partially curing the resin, the resin can be mixed with filler particles. The resin and filler particles can be mixed, say, in a planetary mixer, and can be exposed to an ambient pressure less than atmospheric pressure during mixing. Subsequent to mixing the resin and filler particles, the resin can be fully cured. The fully-cured resin can be disposed between first and second conductive components configured to be maintained at different potentials, such as between a phase conductor and a ground conductor.

Insulating composition and method for making the same

A circuit breaker having an arc quenching system is provided. The quenching system includes an ablative device positioned within a chamber. On end of the ablative device includes an opening that receives a stationary contact. A movable contact arm travels within a channel between the closed position and an open position. When an abnormal operating condition is detected, the circuit breaker trips causing the contact arm to move. This generates a plasma arc that evaporates material from the ablative device. The evaporated material generates a pressurized gas that cools and quenches the plasma arc to improve the performance of the circuit breaker during undesired operating conditions such as a short circuit.

Circuit breaker with improved arc quenching

An ablative plasma gun having a dual power source pulse generator is configured to generate a high voltage low current pulse and a low voltage high current pulse. A pair of electrodes are disposed and configured to receive the high voltage low current pulse, and to receive the low voltage high current pulse in response to the high voltage low current pulse.

Dual power source pulse generator for a triggering system

An electrical pulse circuit is disclosed. The electrical pulse circuit is in connection with a first pair of electrodes defining a first gap between ends thereof and a second pair of electrodes defining a second gap between ends thereof. The second gap is disposed proximate to the first gap. The circuit includes a controller, a first electrical pulse source in power connection with the first pair of electrodes, and a second electrical pulse source in power connection with the second pair of electrodes. The first electrical pulse source is productive of a high voltage low current arc across the first gap in response to the controller and the second electrical pulse source is productive of a low voltage high current arc across the second gap in response to the controller and the high voltage arc.

Electrical pulse circuit

A dual power source pulse generator in power connection with a pair of electrodes having a first electrode, a second electrode and an air gap therebetween. The dual power source pulse generator includes a first pulse source producing a high voltage low current pulse across the pair of electrodes to allow dielectric breakdown, and a second pulse source electrically connected in parallel with an output of the first pulse source, and producing a low voltage high current pulse to thereby produce a current flow of high-density plasma between the same electrodes of the pair of electrodes in response to the high voltage low current pulse.

A process to reduce or prevent biofouling, by destroying or deactivating microbiological content of feedwater, or other liquid, prior to its entrance into membranes or process equipment, such as heat transfer equipment. The process comprises the use of electrical discharge and/or electric fields to destroy microbes that result in the biofouling of surfaces. By destroying the microbiological content of the water the microbiology no longer is able to create a restricting biofilm upon or within said process equipment.

Process for the reduction of biofouling using electric fields

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Bengaluru, India

Thangavelu Asokan