Eastman-kodak Company

Thaddeus D Koszelak

Paul B Gilman, Jr

Anthony Adin

Robert T Belly

Roland G Willis

Seymour Zigman

A photographic element and emulsion are described which comprise a negative working silver halide emulsion layer, a hydrazine compound nucleating agent and an electron accepting antifogging dye. Enhanced sensitometric properties are obtained. A process for developing such element or emulsion is also described.

Photographic element and emulsion having enhanced sensitometric

Methine dyes which inhibit cell growth are identified by (1) determining the reduction potential of the dye, (2) determining the ability of the dye to sorb to the cells and (3) selecting those dyes which have a reduction potential more negative than about -0.8 volt and which are sorbed to the cells.

Process for selecting methine dyes which inhibit cell growth

A print-out image can be produced with certain internally photosensitive silver halide materials by a high intensity exposure to provide a print-out image that is resistant to background print-up under ambient illumination. The photographic silver halide material with which the process is useful comprises photosensitive silver halide grains in which the sensitivity sites where a latent image can be formed on light exposure are predominantly inside the grains. Also, at least one electron-accepting compound having a polarographic reduction potential within the range of about -0.8 volt to about -0.01 volt is required on the photosensitive silver halide in the process. The photosensitive silver halide is imagewise exposed to illumination having an intensity greater than about 3 watts per square centimeter. Following imagewise exposure, a print-out image can be observed; if the exposed element is not exposed to ambient light, the print-out image can be intensified by developing in a surface developer. If, however, the exposed element is further exposed to ambient light, the surface image is lost but the print-out image may be intensified by developing with an internal developer.

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Rochester, NY, United States of America

Thaddeus D Koszelak