Koninklijke Philips Corporation N.v.

Asml Netherlands B.v.

Asml Holding N.v.

Cp- Mahk Japan Co., Ltd.

Philips Lighting Holding B.v.

Signify Holding B.v.

Teunis Willem Tukker

Bernardus Hendrikus Wilhelmus Hendriks

Ralph Kurt

Stein Kuiper

Nitesh Pandey

Erik Paul Boonekamp

Gerbrand Van Der Zouw

Michel Cornelis Josephus Marie Vissenberg

Willem Lubertus Ijzerman

Sebastianus Adrianus Goorden

Armand Eugene Albert Koolen

Stanislav Y Smirnov

Joris Jan Vrehen

Aldegonda Lucia Weijers

Ferry Zijp

Arie Jeffrey Den Boef

Johannes Petrus Maria Ansems

Marcellinus Petrus Carolus Michael Krijn

Hans-Helmut Bechtel

Anthonie Hendrik Bergman

Gerhardus Wilhelmus Lucassen

Martinus Petrus Joseph Peeters

Coen Adrianus Verschuren

Markus Franciscus Antonius Eurlings

Sjoerd Stallinga

Ramon Pascal Van Gorkom

Johannes Matheus Marie De Wit

Martijn Henri Richard Lankhorst

Lingli Wang

Mark Eduard Johan Sipkes

Amandev Singh

Han-Kwang Nienhuys

Coen Theodorus Hubertus Fransiscus Liedenbaum

Albert Hendrik Jan Immink

Egbert Lenderink

Peter Alexander Duine

Michael Cornelis Van Beek

Marjolein Van Der Voort

Robert Frans Maria Hendriks

Duygu Akbulut

Elvira Johanna Maria Paulussen

Sietse Thijmen Van Der Post

Jorrit Ernst De Vries

Denis Joseph Carel Van Oers

Hans-Peter Stormberg

Jacobus Maria Antonius Van Den Eerenbeemd

Cornelis Jojakim Jalink

Marco Van As

Marinus Petrus Reijnders

Peter Danny Van Voorst

Edwin Van Lier

Andrei Mijiritskii

Hendrik Josephus Goossens

Marco Andreas Jacobus Van As

Oscar Arturo Chao Pujol

Stefan Michael Bruno Bäumer

Wouter Harry Rensen

Martijn H R Lankhorst

Ole Klembt Andersen

Klemens Brunner

Wilhelmus Adrianus Gerardus Timmers

Jean Paul Jacobs

Bernardus Leonardus Bakker

Jonas Mertes

Ramon Pascal Van Gorkom Van Gorkom

Cornelia Roline Prins

Guido Henri Maria Van Tartwijk

Coen Theodorus Hubertus Fran Liedenbaum

Disclosed is a detection apparatus for simultaneous acquisition of multiple images of an object at a plurality of different focus levels; comprising: a modulator for obtaining multiple beam copies of an incoming beam; and a detector operable to capture said multiple beam copies, such that at two of said multiple beam copies are captured at different focus levels. Also disclosed is an inspection apparatus comprising such a detection system.

Detection apparatus for simultaneous acquisition of multiple diverse images of an object

An optical inspection apparatus, including: an optical metrology tool configured to measure structures, the optical metrology tool including: an electromagnetic (EM) radiation source configured to direct a beam of EM radiation along an EM radiation path; and an adaptive optical system disposed in a portion of the EM radiation path and configured to adjust a shape of a wave front of the beam of EM radiation, the adaptive optical system including: a first aspherical optical element; a second aspherical optical element adjacent the first aspherical optical element; and an actuator configured to cause relative movement between the first optical element and the second optical element in a direction different from a beam axis of the portion of the EM radiation path.

Variable corrector of a wave front

An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration-correcting reflector.

Optical systems, metrology apparatus and associated method

Metrology apparatus and methods for inspecting a substrate are disclosed. A source beam of radiation emitted by a radiation source is split into a measurement beam and a reference beam. A first target on the substrate is illuminated with the measurement beam. A second target separated from the substrate is illuminated with the reference beam. First scattered radiation collected from the first target and second scattered radiation collected from the second target are delivered to the detector. The first scattered radiation interferes with the second scattered radiation at the detector. The first target comprises a first pattern. The second target comprises a second pattern, or a pupil plane image of the second pattern. The first pattern is geometrically identical to the second pattern, the first pattern and the second pattern are periodic and a pitch of the first pattern is identical to a pitch of the second pattern, or both.

Method of inspecting a substrate, metrology apparatus, and lithographic system

A beam homogenizer for homogenizing a beam of radiation and an illumination system and metrology apparatus comprising such a beam homogenizer as provided. The beam homogenizer comprises a filter system having a controllable radial absorption profile and configured to output a filtered beam and an optical mixing element configured to homogenize the filtered beam. The filter system may be configured to homogenize the angular beam profile radially and said optical mixing element may be configured to homogenize the angular beam profile azimuthally.

Beam homogenizer, illumination system and metrology system

A measurement system is disclosed in which a first optical system splits an input radiation beam into a plurality of components. A modulator receives the plurality of components and applies a modulation to at least one of the components independently of at least one other of the components. A second optical system illuminates a target with the plurality of components and directs radiation scattered by the target to a detection system. The detection system distinguishes between each of one or more components, or between each of one or more groups of components, of the radiation directed to the detection system based on the modulation applied to each component or each group of components by the modulator.

Measurement system, lithographic system, and method of measuring a target

Disclosed are an optical system for conditioning a beam of radiation, and an illumination system and metrology apparatus comprising such an optical system. The optical system comprises one or more optical mixing elements in an optical system. The optical system defines at least a first optical mixing stage, at least a second optical mixing stage, and at least one transformation stage, configured such that radiation entering the second optical mixing stage includes a transformed version of radiation exiting the first optical mixing stage. The first and second optical mixing stages can be provided using separate optical mixing elements, or by multiple passes through the same optical mixing element. The transformation stage can be a Fourier transformation stage. Both spatial distribution and angular distribution of illumination can be homogenized as desired.

Radiation conditioning system, illumination system and metrology apparatus, device manufacturing method

Devices and methods for processing a radiation beam with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam comprises components distributed over one or more radiation beam spatial modes. A waveguide supports a plurality of waveguide spatial modes. The optical system directs a plurality of the components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the waveguide in such a way that each of the plurality of components couples to a different set of the waveguide spatial modes, each set comprising one or more of the waveguide spatial modes.

Device and method for processing a radiation beam with coherence

An illumination system has a microLED array. The microLED arrayis imaged or placed very close to a phosphor coated glass discwhich upconverts the light from the microLED array into a narrow band emission. The plate has at least two different photoluminescent materials arranged to be illuminated by the microLED array and to thereby emit output light. The different photoluminescent materials have different emission spectral properties of the output light, e.g. different center wavelength and optionally different bandwidth. Illumination of different photoluminescent materials by the illumination sources is selectable, by selective activation of the microLEDs or by movement of the photoluminescent materials relative to the illumination sources, to provide different illumination of the different photoluminescent materials. This provides tunable spectral properties of the output light. Selectively configurable filtersare arranged to filter the output light in accordance with the selected illumination of the different photoluminescent materials.

Illumination system for a lithographic or inspection apparatus

The invention relates to an illumination device () comprising an optical waveguide () and a number of (connections for) light sources ()&#x2014;especially LEDs&#x2014;positioned along the waveguide (). This waveguide has a central axis () at a distance r to the surface of the waveguide, said surface comprising a light entrance surface () on which the (connections for) light sources are positioned and a curved light exit surface (), wherein, viewed along the circumference of the curved surface (), the distance r to a first intersection () between the flat surface () and the curved surface (), changes to a second distance of different value at the second intersection () between said surfaces. The invention also relates to a luminaire comprising such an illumination device (). Due to the special design of the waveguide (), the amount of reflections of light in the light sources is largely reduced and desired shaping of the exiting beam can be realized. The device can be further improved by the use of special features, like specially designed curved surfaces (), reflective structures (), channels () and torus-shaped waveguides.

Illumination device with waveguide and LEDs

A method for controlling an angular distribution of a light-beam emitted by a light-output device () comprising a first set of light-sources () comprising at least one light-source configured to emit light within a first angular range () and second set of light-sources () comprising at least one light-source configured to emit light within a second angular range (), wherein the first angular range is different from the second angular range. The method comprises the steps of: receiving () a dimmer setting (V) from a dimmer (); controlling (), if the dimmer setting is within a first predetermined range, the first set of light-sources to emit light within the first angular range; and controlling (), if the dimmer setting is within a second predetermined range, the second set of light-sources to emit light within the second angular range. Through the method according to the invention the angular distribution of light emitted from a single light-output device may be controlled using a single switch, thereby avoiding the need for having a plurality of switches and/or new wiring which would otherwise be required.

Dimmer control of angular distribution of light

A circular symmetric optical element for redirecting light which is emitted by a light source through a wavelength converting element, wherein the emitted light have an average color cand a wavelength distribution depending on an emission angle from the wavelength converting element. Light having the average color chave an emission angle t. The optical element comprises: a first optical portion configured to receive and redirect light having emission angles from the wavelength converting element lower than tA, and a second optical portion configured to receive and redirect light having emission angles from the wavelength converting element higher than t, wherein the first and second optical portions are individually configured such that for light of each selected out-coupling angle of the optical element, there is light received and redirected by the first optical portion to the selected out-coupling angle of the optical element, and corresponding light received and redirected by the second optical portion to the selected out-coupling angle from the optical element such that the total light beam emitted from the optical element as seen in the far field have a homogeneous color.

Color correcting optical element

There is provided an arrangement for spot illumination (). The arrangement provides an improved collimation and color mixing unit comprising a LED array (), a convex shaped reflector (), a field lens () and an additional cylindrical reflector () at the exit aperture of the system. In combination with an optical projection system which may comprise at least two additional zoom lenses and a gate (in which several maskers, gobos or shutters could be inserted) the system allows color mixing in an extended operational range including out of focus zoom settings often used to get soft edge spots.

Arrangement for spot illumination

An illumination system () for spot illumination comprising: a tubular reflector () with a reflective inner surface, the tubular reflector having an entrance aperture (), and an exit aperture () being larger than the entrance aperture; and a light-source array () comprising a plurality of light-sources arranged in a physical light-source configuration to emit light into the tubular reflector at the entrance aperture thereof. The tubular reflector () comprises a plurality of reflective surfaces (-) each being arranged to provide a primary mirror image of the light-source array, the primary mirror image having a primary mirror image light-source configuration; and the light-source array () is configured in such a way that, for each of the primary mirror image, at least half of all secondary mirror images of the light-source array resulting from reflection of the primary mirror image by the reflective surfaces (-) exhibit secondary mirror image light-source configurations that are different from the physical light-source configuration.

Illumination system for spot illumination with reduced symmetry

An illumination system () for spot illumination comprising a tubular reflector () with a reflective inner surface, the tubular reflector () having an entrance aperture () and an exit aperture () being larger than the entrance aperture (); a light-source array () comprising a plurality of light-sources (----) arranged to emit light into the tubular reflector () at the entrance aperture thereof; and a light-diffusing optical member () arranged to diffuse light emitted by the illumination system (). The light-diffusing member () is configured to exhibit an increasing diffusing capability with increasing distance from an optic axis () of the illumination system.

Illumination system for spot illumination

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Eindhoven, Netherlands

Teunis Willem Tukker