Nikon Corporation

Nuflare Technology, Inc.

Tetsuyuki Arai

Takayuki Abe

Hideo Tsuchiya

Tomohiro Iijima

Yoshihiko Fujimori

Shigeru Takemoto

A pattern inspection apparatus includes a light source configured to emit a pulsed light, a stage on which an inspection target workpiece is placed, a sensor, including a plurality of light receiving elements two-dimensionally arrayed, configured to capture a pattern image in a two-dimensional region of the inspection target workpiece which is irradiated with the pulsed light, by using the plurality of light receiving elements, and a comparing unit configured to compare data of the pattern image with predetermined reference pattern image data, wherein the stage moves to be shifted by a number of pixels, being the number of natural number times one pixel, between pulses of the pulsed light.

Pattern inspection apparatus and pattern inspection method

A pattern forming apparatus for inverting at least one of plural patterns according to numerical design data respectively representing the plural patterns and synthesizing thus inverted pattern with the remainder of the plural patterns, comprises first operation device for attaching a flag of a positive image to the design data of uninverted patterns, and attaching a flag of an inverted image to the design data of inverted patterns, second operation device for handling the entire area of either inverted patterns or uninverted ones among the plural patterns as a single pattern, and attaching a corresponding flag to the design data of the pattern, and image forming device for forming image data of the area according to the data of the second operation device and then forming image data of each pattern according to the data of the first operation device.

Mask inspecting apparatus

Growing community of inventors

Kanagawa, Japan

Tetsuyuki Arai