Central Japan Railway Company

Teijin Limited

Tokyo Ohka Kogyo Co., Ltd.

Tetsuya Shichi

Akira Fujishima

Christopher Cordonier

Yasuhiro Katsumata

Kenichi Katsumata

Akimasa Nakamura

Takafumi Numata

Teruo Komine

Kenichirou Amemiya

Makoto Yamashita

Toshiyuki Ogata

Takayoshi Sasaki

Tatsuya Ekinaka

Takehiro Suga

Toshio Kita

Motoki Takahashi

Teruhiro Uematsu

Ryo Niimi

Yuta Toyoshima

Daisuke Yoshioka

Hiroshi Uetsuka

Sohei Okazaki

Koji Oshika

Yuji Kaneko

Katsuhiko Takagi

A laminate having excellent abrasion resistance to physical stimuli such as dust. The laminate comprises a base layer, a hard coat layer and a top coat layer comprising flaky metal oxide fine particles all of which are formed in this order. The flaky metal oxide fine particles are hardened by at least one method selected from the group consisting of ionizing material exposure, ionizing radiation exposure, infrared exposure, microwave exposure and high-temperature vapor exposure.

Laminate having a top coat layer containing flaky metal oxide fine particles

Disclosed is a method for forming a photocatalyst thin film, which is characterized in that a photocatalyst thin film containing a niobium-alkali metal complex oxide is formed by forming and then firing a layer containing niobium on the surface of a base containing an alkali metal.

Photocatalytic film, method for forming photocatalytic film and photocatalytic film coated product

Disclosed is a method for forming a photocatalyst thin film, which is characterized in that a photocatalyst thin film containing a niobium-alkali metal complex oxide is formed by forming and then firing a layer containing a niobia nanosheet on the surface of a base containing an alkali metal.

A coating liquid including one or more of metal complexes selected from a metal complex A represented by Chemical Formula 1, a metal complex B represented by Chemical Formula 2, and a metal complex C represented by Chemical Formula 3. M in Formula 1, 2 and 3 represents a metal ion. Each of X-Xin Formula 1, 2 and 3 is one of O, NH, COand S. Each of Y-Yin Formula 1 and Y-Yin Formula 3 is either CH or N. Each of Z-Zin Formula 2 and 3 and Z-Zin Formula 2 is one selected from a group of O, NH and S, and two selected from a group of CH and N. L represents an axial ligand. k represents a valence of each of the metal complexes and is equal to a sum of electric charges of M, X-Xand L.

Coating liquid, metal compound film formed by coating liquid, and forming method thereof

Disclosed is a positive-type photosensitive composition which can form a metal compound film pattern at high resolution and with less affection by organic residues. The positive-type photosensitive composition comprises: a metal complex component (A) which can form a metal compound film when applied and subsequently fired; and a photosensitizing agent (B). In the composition, a ligand in the component (A) is preferably a multidentate ligand having an aromatic compound as its skeleton. According to this construction, even a composition containing substantially no photosensitive resin can impart photosensitivity and a metal compound film pattern can be formed readily.

Positive-type photosensitive composition

This invention provides a coating agent, which can form a coating film over a wide area in a simple manner, is chemically and physically stable, and can form an ultrathin film, a coating film, a method for formation of coating film, and various products coated with the coating film. The coating agent contains thin sheet titanium oxide fine particles. The coating agent may comprise a solution containing a titania nanosheet and a sol of silicon oxide or titanium oxide. The coating film is formed by coating and then drying and heating the coating and has a microstructure in which thin sheet titanium oxide fine particles are stacked with a high level of orientation.

Titanium oxide coating agent and titanium oxide film forming method

The present invention provides a technology related to a conductive film which is high in transparency, conductivity, and adhesiveness to a base plate. The present invention also provides a coating liquid including metal materials reacting with a ligand represented by a particular Chemical Formula and including indium (In), tin (Sn), or both thereof.

Coating liquid, conductive film formed by coating liquid, and forming method thereof

The present invention provides a coating liquid including organic metal complexes represented by Chemical Formula 1. R-Rin Chemical Formula 1 is one of the followings (1)-(4):

Coating liquid, titanium oxide film formed by coating liquid, and forming method thereof

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Aichi, Japan

Tetsuya Shichi