Hitachi, Ltd.

Hitachi-high-technologies Corporation

Tetsuya Sawahata

Mitsugu Sato

Takashi Ohshima

Sukehiro Ito

Michio Hatano

Yasuko Aoki

Yoichi Ose

Hideo Morishita

Shuichi Takeuchi

Atsushi Muto

Mine Araki

Yasuko Watanabe

Hiroyuki Honda

Disclosed is a charged particle radiation device having a charged particle source which generates a charged particle as a probe, a charged particle optical system, a sample stage, a vacuum discharge system, an aperture which restricts a probe, a conductive film, and a charged particle detector, wherein the conductive film is provided at a position excluding the optical axis of the optical system between the sample stage and the aperture; and the distance between the sensing surface of the surface of the charged particle detector and the sample stage is larger than the distance between the sample stage and the conductive film, so that the surface of the conductive film and the sensing surface of the detector are inclined.

Charged particle radiation device with bandpass detection

In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (-); an aperture () that limits the diameter of the charged particle beam (); optics () for the charged particle beam; a specimen holder (); a charged particle detector () that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector () is provided with a first small detector () having a first detection sensitivity and a second small detector () having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam () is to be radiated, to be the same for the first small detector () and the second small detector ().

Charged particle beam apparatus

An object of the present invention is to provide a scanning electron microscope including decelerating-electric-field forming means for decreasing the energy of a beam of electrons reaching a sample, and being capable of selectively detecting BSEs with high efficiency. To this end, the scanning electron microscope including the decelerating-electric-field forming means has a detector for detecting electrons. The detector includes a part for receiving the electrons at a position which is positioned outside trajectories of SEs accelerated by the decelerating-electric-field forming means, and which is further away from the optical axis of the beam of electrons than the trajectories of the SEs.

Scanning electron microscope

According to the present invention, there are newly provided in a scanning electron microscope with an in-lens system a first low-magnification mode that sets the current of the object lens to be zero or in a weak excitation state, and a second low-magnification mode that sets the current of the object lens to be a value that changes in proportion to the square root of the accelerating voltage. The scanning electron microscope has a configuration wherein normal sample image (secondary electron image) observation is performed in the first low-magnification mode, and it switches the first low-magnification mode to the second low-magnification mode when X-ray analysis is performed. As a result, both sample image (secondary electron image) observation and X-ray analysis can be performed in low-magnification mode.

Scanning electron microscope and sample observation method using the same

A scanning electron microscope which obtains a two-dimensional scan image of a sample includes an electron source and a scan deflector for scanning a primary electron ray generated from said electron source onto the sample. An objective lens forms a focusing magnetic field onto the sample, such as to surround the sample, the focusing magnetic field focusing the primary electron ray. A secondary signal detector for deflecting and detecting a secondary signal generated from the sample by irradiation of the primary electron ray obtains secondary electrons from a secondary electron conversion electrode for generating secondary electrons by collision of electrons, which is disposed between the objective lens and the detector at a location that is closer to the electron source than the objective lens is and at a location that is closer to the sample than the secondary signal detector is.

Growing community of inventors

Hitachinaka, Japan

Tetsuya Sawahata