Shimadzu Corporation

Onkyo Corporation

Nippon Packing Co., Ltd.

Tetsuya Nagano

Masaru Koeda

Shinji Miyauchi

Kichiya Tanino

Makoto Sato

Kazuo Sano

Yasuhiro Akune

Kuniaki Yamamoto

Eiji Ishiguro

Akira Sato

To be able to activate a self-device when an input digital audio signal is an audio signal indicating sound. An AV receiverincludes a detection circuitthat detects that a digital audio signal terminal is connected and supplies a detection signal, a DIRthat converts an SPDIF signal into an I2S signal when the detection circuitsupplies the detection signal, a detection circuitthat detects that the I2S signal into which the DIRconvers is an audio signal indicating sound and supplies a detection signal, and a microcomputerthat activates the AV receiverwhen the detection circuitsupplies the detection signal.

Audio processing device

A grating of the present invention has a groove cross section shaped, for example, like a sinusoidal wave or a sawtooth other than a laminar shape, and a groove bottom part shaped as a flat form. In a region wherein the groove cycle and the used wavelength are the same degree for wavelengths from near infrared to infrared, the grating of the present invention has the excellent spectrum performance (high efficiency in balance in a wide wavelength zone) more than a holographic grating and an echellette grating in related arts. When replicas for the grating of the present invention are manufactured, the engagement force of grooves with each other is small as the groove aspect ratio is small, and a release agent sufficiently reaches the groove bottom as the groove bottom is large.

Grating, negative and replica gratings of the grating, and method of manufacturing the same

The present invention discloses diffraction gratings which do not generate any thermal strain and can perform extremely high-precision and high-efficiency diffraction nearly free from scattered beams. The diffraction gratings are built by allowing the chemically deposited film of silicon carbide whose crystal planes are strongly oriented to the (220) planes in terms of Miller indices to form on the substrate comprising sintered silicon carbide, polishing the surface of the deposited film to 5 .ANG. RMS or less, and directly etched laminar-type grating grooves on that surface by using ion-beam etching.

Diffraction grating

A dry etching method for etching a surface of a substrate with plasma of mixed gas including i) gas that is reactive to the material of the substrate, and ii) inert gas. Accumulation of reaction products between the substrate and the reactive gas ions on the substrate is effectively eliminated by the ions of the inert gas plasma. Accordingly the etching rate of the substrate is not lowered. Silicon carbide (SiC) is one of the most suitable object of the plasma etching of the present invention, since it is hard to engrave by conventional dry etching methods.

Dry etching method and its application

Growing community of inventors

Osaka, Japan

Tetsuya Nagano