Sumitomo Osaka Cement Co., Ltd.

Tohoku University

Tetsuya Fujino

Junichiro Ichikawa

Katsutoshi Kondou

Takashi Shinriki

Motohiro Takemura

Masanao Kurihara

Satoshi Oikawa

Toru Sugamata

Toshihiro Sakamoto

Tetsuya Goto

Masayuki Motoya

Hirotoshi Nagata

Hideki Ichimei

Yuji Yamane

Yu Nakata

Yasuyuki Miyama

Yuu Nakata

Teppei Yanagawa

Provided is an optical waveguide element capable of connection such as wire bonding, suppressing usage of gold, and suppressing deterioration of a conductor loss. An optical waveguide element includes a substratehaving an electro-optic effect, an optical waveguideformed on the substrate, and a control electrode () provided on the substrate and controlling a light wave propagating through the optical waveguide. The control electrode is made of a material other than gold, and the gold is disposed on at least a wire bonding portionof the control electrode.

Optical waveguide element

In a waveguide-type optical modulation element that modulates light by applying radio frequency signals to an electrode, the realization of the additional broadening of the bandwidth by improving the degree of freedom in the design of the electrode is enabled. An optical modulation element, which includes optical waveguides provided in a substrate and electrodes that control light waves propagating through the optical waveguides and modulates light by propagating radio frequency signals to the electrodes, in which the electrodes include conductive layers made of copper or a copper alloy and protective layers made of a material other than copper and a copper alloy.

Optical modulation element

An optical control element including an optical waveguide formed by using diffusion of titanium that is formed on a lithium niobate substrate and a control electrode formed on the lithium niobate substrate that is provided in the vicinity of the optical waveguide, in which an amount of a hydroxyl group absorbed into the lithium niobate substrate is set to be in a range of 0.5 to 2.5 cm.

Optical control element

An optical waveguide device includes a substrate with an electro-optic effect on which an optical waveguide and an electrode for controlling optical waves propagating through the optical waveguide are formed and at least one light source for irradiating ultraviolet light on the substrate.

Optical waveguide device

To effectively prevent the acceleration of the drift phenomenon generated by the application of a high electric field to a substrate through a bias electrode in a waveguide type optical element. A waveguide type optical element includes a substrate () having an electro-optic effect, two optical waveguides (and) disposed on a surface of the substrate, a non-conductive layer () which is disposed on the substrate and is made of a material having a lower dielectric constant than the substrate, and a control electrode () which is disposed on the non-conductive layer and is intended to generate a refractive index difference between the two optical waveguides by respectively applying electric fields to the two optical waveguides, and the non-conductive layer is constituted of a material which includes silicon oxide, an oxide of indium, and an oxide of titanium and has a ratio between a molar concentration of the titanium oxide and a molar concentration of indium oxide of 1.2 or more, and a voltage generating an electric field of 1 V/&#x3bc;m or more in the substrate is applied to the control electrode.

Waveguide type optical element

An object of the present invention is to provide an optical waveguide element that effectively diffuses charges accumulated in a substrate, and suppress DC drift or temperature drift. The optical waveguide element includes a substrate having an electro-optical effect, optical waveguides formed in the substrate, a buffer layer (BF layer) formed on the substrate, and modulation electrodes (signal electrode and ground electrode) that are formed on the buffer layer and modulate optical waves propagating through the optical waveguides, a charge diffusion layer that diffuses charges generated in the substrate is formed between the substrate and the buffer layer, and the charge diffusion layer is electrically connected with a ground electrode constituting the modulation electrode.

An object of the present invention is to provide a manufacturing method of an optical waveguide element whose DC drift is suppressed, and to provide a manufacturing method of an optical waveguide element, capable of adjusting DC drift in the middle of manufacturing processes so as to improve a fabrication yield. The method of manufacturing an optical waveguide element comprises a step of forming an optical waveguide in a substrate having an electro-optic effect, a step of forming a buffer layer, and a step of forming an electrode, in which one stage or a plurality of stages of an interface diffusion layer heat adjustment step (S, S) for adjusting a concentration distribution of a specific substance in the buffer layer by heating is included after the buffer layer is formed.

Optical waveguide element and method of manufacturing the same

An optical waveguide device that uses a thin substrate having an electro-optical effect and a thickness of 10 &#x3bc;m or less, in which slab propagation light that is reflected from an end face of the device is removed and thus deterioration in an operational characteristic is suppressed. The optical waveguide device includes: a thin substrate which has an electro-optical effect and thickness of 10 &#x3bc;m or less, and in which an optical waveguide is formed; and a supporting substrate that is adhered to the thin substrate through an adhesion layer. An antireflective film is formed on a part of a side surface of the optical waveguide device.

An optical waveguide is formed on a substrate made of a material with an electro-optic effect. Then, an intermediate layer is fabricated, on the main surface of the substrate, by a dielectric material selected from the group consisting of AOx, B Oy, COz (A: divalent element, B: trivalent element, C: quadrivalent element, 0<x<1, 0<y<3, 0<z<2, O: oxygen). Then, a metal-cladding type optical polarizer is fabricated on the intermediate layer and the optical waveguide. A buffer layer is formed and partially removed by non-reactive dry-etching to form a first opening. Subsequently, a metal-cladding type optical polarizer is fabricated inside the first opening, and a signal electrode and a ground electrode, constituting a modulation electrode, are fabricated on the buffer layer.

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Tokyo, Japan

Tetsuya Fujino